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Electron optical image correction subsystem in electron beam projection lithographyA novel magnetic microstigmator was developed for the astigmatism correction in the electron beam microcolumn system. The magnetic microstigmator consists of eight magnetic poles coupled with micromachined solenoid-type coils that are divided into four pairs. The proposed magnetic microstigmator was fabricated using microelectromechamical system technology and was assembled in an electron beam microcolumn for testing. The preliminary experimental results show that the developed magnetic microstigmator can effectively correct the astigmatism of the electron beam in the electron beam microcolumn with a driving current of 300 mA and low power. Rong et al.: Novel magnetic microstigmator for electron beam microcolumn system 2022

A magnetic microdeflector was developed for the electron beam microcolumn system to control the electron beam deflection/scanning. The magnetic microdeflector fabricated by the microelectromechanical system technology consists of four magnetic poles coupled with solenoid-type micromachined inductors with NiFe permalloy magnetic cores. The four magnetic poles are divided into two pairs which control the electron beam deflection/scanning in X and Y axes, respectively. Experimental results show that the electron beam deflection increases linearly to 210 m with a driving current of 50 mA and an electrical power consumption of 3 mW. The fabricated magnetic microdeflector has a good dynamic property, as shown by the rise time of 25 ns with respect to a 50 mA step signal. The developed magnetic deflector demonstrates excellent performance in controlling the electron beam deflection/scanning for the electron beam microcolumn system.