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Nanometer fabrication using selective thermal desorption of SiO 2 induced by focused electron beams and electron beam interference fringesWe have discovered and developed a process where positive relief structures in silica sol-gel films can be made using electron beam writing methods. Electron beam cured sol-gel structures have been made that have lateral and vertical dimensions both on the micron and nanometer scales. The sol-gel structures can be used as etch masks or deposition masks on substrates or can be used directly as positive relief molds for embossing the micro-or nanoscale features into other materials.