We report on a lithographic technique that uses self-assembled monolayers ͑SAMs͒ as a resist to fabricate patterned, chemically functionalized surfaces. Large area line, square, and triangular patterns with a periodicity of 532 nm were generated exposing SAMs of hydrophobic or hydrophilic alkanethiolates to an ultraviolet laser interference pattern at 193 nm for only a few minutes ͑corresponding to ϳ16 J/cm 2 ͒ followed by the immersion into an alternating thiol. Patterned films of CaCO 3 , Zn͑OH͒ 2 , and polymers were directly deposited on these templates. Using substrates patterned with oppositely charged SAMs, large periodic arrays of charged colloids were fabricated.