Experiments investigating the use of TaN thin films for measurements of pressure over a wide range have proved to give good results, because the TaN thin films have large effective heat conducting areas available to increase the sensitivity, suitable resistance, and large temperatures coefficients of resistance. These experiments led to the construction of a film system consisting of a TaN thin film deposited on a miniature 7059 Corning glass substrate by reactive plasma sputtering. With this system, it is possible to measure pressure changes in the range of 105 to 10−3 Pa. A detailed description of the characteristics of the TaN film gauge as well as the calibration curves are given.

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