Negative ions in low-pressure plasma sources are created either in the plasma volume by dissociative attachment or, at the plasma surface interaction due to surface ionization of backscattered or sputtered particles. Negative-ions formed on surfaces are accelerated towards the plasma by the sheath. They can influence the plasma kinetics through collisions with plasma species, or are self-extracted from the plasma thanks to the energy acquired in the sheath. Self-extraction of negative-ions can affect processes like sputtering, where the negative-ions formed on the cathode bombard the layer being deposited. In applications such as negative-ion sources for accelerator or fusion devices, it is taken advantage of negative-ion surface production. A low work-function material (usually caesium-covered metals) is in contact with the plasma and greatly enhances negative-ion production because of the low energy required to extract an electron from the surface. However, caesium free negative-ion sources would be greatly valuable for fusion applications because of the strong maintenance constraints induced by caesium injection.