No abstract

In this study, the electrostatic spray assisted ESA-MOCVD has advantages of simple apparatus without the gas lines, easy control of nano-sized droplets by applied voltage and solution rates and easy control of compositions of thin films by controlling the composition of starting solution. The effect of deposition parameter on the growth behavior of Ti02 thin films such as substrate temperature, deposition time, applied voltage, and oxygen rates, annealing effect were investigated. The microstructure, composition and roughness were characterized SEM, X P S and AFM, respectively. XRD was used to determine crystallization. Finally we found how to adjust to deposit BaO and SrO thin films by ESA-MOCVD.Keywords: Electrostatic Spray Assisted (ESA) MOCVD, nano-sized droplet, metal organic source.