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Full-field optical measurement of curvatures in ultra-thin-film-substrate systems in the range of geometrically nonlinear deformations

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We demonstrate an optical two-beam deflection setup for in situ stress measurements in thin films. By using improved position sensitive photodetectors we reach a resolution of better than 10−4 m−1 for substrate curvature measurement at a bandwidth of 1 kHz, with a relatively short optical path of 0.53 m and without employing a lock-in technique.

Different growth stages and the microstructure of amorphous CuTi films are investigated by scanning tunneling microscopy and small angle neutron scattering. During film growth at room temperature, the initially smooth films show increasing surface roughening and finally a change to a columnar growth mode with column diameters of about 20 nm. The interfacial energies associated with the column boundaries are higher than those of grain boundaries in crystalline systems. The column boundaries might be the origin of high intrinsic tensile stresses measured before in the amorphous CuTi films.