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The silicon-sensor field is now more than 35 years old, and meanwhile a deluge of novel silicon-based sensors has been presented in the literature. This review paper concentrates on the principal advances in the field of silicon sensors in the last decade. The material is dealt with according to the commonly accepted classification: radiant, mechanical, thermal, magnetic and chemical sensors. There have also been many new developments in the field of silicon-sensor technology.The most important of these are described in the section on technology. Modem information-processing systems need sensors which do not require periodic calibration and which also have a bus-compatible output. The last section describes the latest developments on smart sensors that meet these demands.The paper concludes with some remarks about the expected growth of the silicon-sensor field in the near future.

The Fraunhofer IPMS and Micronic Laser Systems AB have developed a technology for microlithography using spatial light modulation (SLM). This technology uses an array of micromirrors as a programmable mask, which allows parallel writing of 1 million pixels with a frame rate of up to 2 kHz. The SLM is fabricated at the IPMS using its high-voltage CMOS process. The mirrors are fabricated by surface micromachining using a polymer as sacrificial layer. The mirrors are operated in an analog mode to allow sub-pixel placement of pattern features. This paper describes the function of the SLM with an emphasis on the stability of the mirror deflection and a method to improve it which has been implemented

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