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The electrical characteristics of thin films formed from Si nanoparticles (nc-Si) with various degrees of doping are studied. To exclude the influence of ionic conductivity, the current parameters of the films were recorded in an ultrahigh vacuum (P ~ 3 – 5∙10–9 Torr) with preliminary high-temperature (9500C) annealing. An analysis of the temperature dependences of the conductivity showed that in nc-Si films formed from heavily doped nanoparticles (the concentration of free electrons ne is greater than 1019 cm-3), the transport is determined by variable-length hopping (VRH). In these samples, the Mott conductivity prevails at temperatures above 300C and at lower temperatures, the Efros-Shklovskii type variable range hopping conduction is dominate. In films with a medium level of doping of nanoparticles (ne <1019 cm-3), transport is realized by the Mott, Efros - Shklovskii and thermally activated conductivities. At the same time, thermally activated conductivity is dominated at temperatures above 560K. In nc-Si films formed from undoped nanoparticles, the transport parameters are determined by thermally activated conductivity and Mott's conductivity. Conductivity of Efros - Shklovskii is not observed in such films. From the analysis of the parameters corresponding to the Mott and Efros - Shklovsky conductivities, the localization lengths of wave functions, the density of states at the Fermi level (g (EF)), and average hopping lengths are found. The average hopping lengths in nc-Si films from nanoparticles pre-etched in HF are in the range 56 - 86 nm, which indicates that hopping in such films occurs via intermediate nanoparticles.

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Oxidation of HF vapor-etched nanocrystalline silicon films, prepared by drop coating from nanocrystalline Si sol in acetonitrile, was studied. Oxidation of nc-Si at room temperature in air with 5% and 86% relative humidity was observed by means of IR spectroscopy for 2 days. The change in film mass after 15 hours of oxidation was determined using quartz crystal microbalance. In dry air, film mass and integral intensity of bands attributed to vibrations in Si3-x‒Si‒Hx and Si-O-Si groups changed linearly with time. In humid air, intensity of in Si3-x‒Si‒Hx band decays exponentially and intensity of Si-O-Si band increases as a square root of oxidation time. Film mass gain after 15 hours of oxidation corresponds to an average oxide layer thickness of 0.02 nm in dry air and 0.51 nm in wet air.