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Articles you may be interested inEffects of the cathode grain size and substrate fixture movement on the evolution of arc evaporated Cr-cathodes and Cr-N coating synthesis J. Vac. Sci. Technol. A 32, 021515 (2014); 10.1116/1.4865923 Thermal loading of laser induced plasma shockwaves on thin films in nanoparticle removal Hot hollow cathode diffuse arc deposition of chromium nitride films J. Vac. Sci. Technol. A 23, 959 (2005); 10.1116/1.1914813 Errata: "Synthesis, characterization, and modeling of high quality ferromagnetic Cr-doped AlN thin films" [Appl.Chromium nitride films were deposited by activated reactive evaporation of chromium in an ammonia plasma. The structure, crystallite size, composition, and surface morphology of the films have been investigated and correlated to the deposition parameters. The nitrogen-tochromium ratio in the films is found to increase with the substrate temperature, leading to a gradual transition from Cr-N solid solution to Cr 2 N and CrN phases. A mixture of these phases is formed at substrate temperatures below 773 K and a single-phase CrN is formed above 773 K. The nitrogen incorporation in the films decreases the grain size of the films whereas the reaction between chromium and nitrogen resulting in Cr 2 N and CrN phases increases the grain size.