The atom transfer radical polymerization (ATRP) of hexadecyl acrylate (HDA) was carried out in N, Ndimethylformamide (DMF) in the presence of CuSCN/N,N,N',N'',N''-pentamethyldiethylenetriamine (PMDETA).The results indicate that the polymerization is well-controlled: a linear increase of molecular weights occurs with respect to conversion and the polydispersities are relatively low. In particular, the use of CuSCN as the catalyst resulted in faster polymerization rates for hexadecyl acrylate than did those using either CuBr or CuCl; the polydispersity, however, was larger than those obtained in the cases when CuBr and CuCl were used. In addition, we report the thermodynamic data and activation parameters for the solution ATRP of hexadecyl acrylate.

Comparative literature and world literature were originally two independent disciplines, but now they are merged into one. In the era of big data, building an efficient information management method is one of the important contents of university reform. Based on the construction of comparative literature and world literature, this paper applies the DSS (Decision Support System) structure based on data warehouse to the construction of comparative literature and world literature, and constructs the DSS structure of comparative literature and world literature. The related knowledge of DM (data mining) is used for research, and the application design and implementation process of DM are introduced into the subject quality evaluation system. The research shows that the experimental results of NB (Naive Bayes) algorithm will not take too long, about 56.08 s, and the compression ratio is 0.897, when the parameters are basically the same. This model can effectively help schools to analyze data and make decisions, and improve the level of information construction in schools.

A series of novel copolymers [p (AOBHA-co-NPMA)] containing 2-Allyloxy-N-benzylidene hexadecylamine (AOBHA) as film formation material and β-naphtayl methacrylate (NPMA) as photosensitive group were synthesized by free-radical polymerization. The copolymers could form stable condensed monolayer at air/water interface and be transformed onto solid substrates. Positive-tone patterns with the resolution of 0.75 μm of the copolymers Langmuir-Blodgett (LB) films with 35 layers were fabricated by deep UV irradiation, followed by developing with acetone. The etched gold patterns with resolution of 0.75 μm were also obtained, showing that the copolymer has enough resistance to wet etching suitable for fabricating photomask. The mechanism of photolysis was also investigated by UV and GPC, in which showed that the scission of main and side chain of p (AOBHA-co-NPMA) LB films occurred at the same time.

A series of copolymer containing photoactive anthracene group, poly(N-dodecylmeth- acrylamide-co-anthrylmethylacrylate) p(DDMA-co-AnMA) were synthesized. Their molecular arrangement and photolithographic properties in Langmuir–Blodgett (LB) films were investigated. The copolymer p(DDMA-co-AnMA) could form stable monolayer at air/water interface and could be transferred onto solid supports, giving Y-type uniform LB films. The result showed that the irradiation with difference light wavelength leaded to changes of copolymer LB films in their chemical structure, concerning only the anthracence unit. When irradiated at 248 nm, the anthracene acted as photodecomposition group because of the peroxides. On the other hand, the main photoreaction induced by 365 nm is dimerization of anthracene. As a result, posotive-tone and negative-tone pattern could get by choosing a suittable irradiation light wavelength. Etching resistance of p(DDMA-AnMA) LB films was also investigated in a nanometer regime permitting etching of gold.

A series of novel copolymers poly (AOBDA-co-DNMMA)s containing 2-Allyloxy-N-benzyl- idene dodecylamine (AOBDA) and 1.4-dioxaspiro[4.4] nonane-2-methyl methacrylate (DNMMA) were synthesized. The copolymers could form stable condensed monolayer at air/water interface and be transformed onto solid substrates successively. Positive-tone patterns with the resolution of 0.75 μm of the copolymers Langmuir-Blodgett (LB) films with 40 layers were obtained by deep UV irradiation, followed by developing in acetone. The etched gold patterns with resolution of 0.75 μm were also obtained, showing that the copolymer has enough resistance to wet etching suitable for fabricating photomask. The mechanism of photolysis was also investigated by UV, IR and GPC.