The Cu(111) surface is an important substrate for catalysis and the growth of 2D materials, but a comprehensive understanding of the preparation and formation of well-ordered and atomically clean Cu(111) surfaces is still lacking. In this work, the morphology and structure changes of the Cu(111) surface after treatment by ion bombardment and annealing with a temperature range of 300–720 °C are investigated systematically by using in situ low-temperature scanning tunneling microscopy. With the increase of annealing temperature, the surface morphology changes from corrugation to straight edge, the number of screw dislocations changes from none to numerous, and the surface atomic structure changes from disordered to ordered structures (with many reconstructions). In addition, the changing trend of step width and step height in different stages is different (first increased and then decreased). A perfect Cu(111) surface with a step height of one atom layer (0.21 nm) and a width of more than 150 nm was obtained. In addition, two interesting superstructures and a new surface phase with a large number of line defects were found. This work serves as a strong foundation for understanding the properties of Cu(111) surface, and it also provides important guidance for the effective pretreatment of Cu(111) substrates, which are widely used.

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