No abstract

No abstract

Hard chromium electroplating had contributed much to inKonkuk University 380-701 Chungju Korea dustry over 50 years before environmental problem by hexavalent chrome has risen. Many researches related with hexavaIn atmospheric plasma process, some active species, like ozone lent chromium replacement have been conducted according and hydroxy radical, generate from reaction among nitrogen, to extension of awareness about such environmental problem. oxygen and water vapor etc. For better understanding about Among these studies, A investigation has been undertaken by generation of active species by atmospheric plasma, OES anal-nitrogen plasma ion implantation and pulsed plasma process yses were carried out in atmospheric pressure in multipoint to develop the novel process as an alternative to hexavalent corona and some DBD types. Our experimental DBD types chromium electroplating.are volume DBD, surface DBD and coplanar DBD. We com.In this study, Cr plating from trivalency chrome hath.was pared with the relative intensity of active species from OES conducted, followed hy the plasma ion implantation (PIII). data. And we also calculated the intensity ratio of the first treatment to improve mechanical properties of the trivalency negative system of Nl(391.4nm) to the second positive sys-chrome plated film. Nitrogen ion implantation was contem of N2(337.1nm) to know which type of plasma generate ducted onto Cr plating layer under the conditions of sevthe electrons with higher energy. And from these results, we eral implantation doses and implantation energies. The films concluded the relationship between the intensity of electron were characterized by optical microscope, RBS and nanoenergy and generation of active species in each type of the indentator. atmospheric plasma.From the results, color of f i l m surface after ion implantation was changed to gray, and number of crack in the trimlency chrome plated layer increased. XRD analysis of the films indicated the formation of hard compound layer of chromium-nitride. The surface hardness was improved from! 13 to 17 GPa and projected range (implantation depth)of ni-i trogen ions in the film was 30 nm. The detailed results will ' thinfilmOyonsei.ac.kr hepresentd.. I

No abstract