We have fabricated optical rotators inside a silica substrate and rotated them by a laser trapping technique. The fabrication method used was femtosecond laser-assisted etching, i.e., modification of the host material by irradiation with femtosecond laser pulses along a predesigned pattern, followed by selective chemical etching. The rotators, which consist of the same material as the substrate, can move inside the microcavity but cannot get out. The rotation speed was proportional to the trapping laser power, and the maximum achieved was about 100 rpm. Such rotators will be applicable to micro-total-analysis systems and microfluidics.

In this paper we propose the concept of a ship-in-a-bottle optical rotator, which is a microscale object, rotatable by a laser manipulation technique, inside a transparent solid. Femtosecond laserassisted etching of sapphire was used to fabricate this microstructure. We report our attempts at fabrication, and discuss the strategy for completing the fabrication.

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ABSTRECTIn this paper the optimization of illumination condition and mask bias in semiconductor lithography is reported, in the case of using half-tone mask (HTM) and off-axis illumination (OAT). Its results are to control the line width and to enlarge the common process margin for both isolated and dense 0. 18tm-O. 15 itm pattern with KrF and ArF lithography. It found that for 0. 1 8im pattern KrF needs every resolution enhancement technology (RET), for example, HTM, OAI and iso/dense optical proximity correction (OPC). For 0. 15im pattern KrF needs more than O.65NA additionally. On the other hand ArF needs less than O.55NA.