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Abstract-Clone change management is one of crucial issues in open source software(OSS) development as well as in industrial software development (e.g., development of social infrastructure, financial system, and medical equipment). When an industrial developer fixes a defect, he/she has to find the code clones corresponding to the code fragment including it. So far, several studies performed on the analysis of clone evolution in OSS. However, to our knowledge, a few researches have been reported on an application of a clone change management system to industrial development process. In this paper, we propose a clone change management system based on the categorization of clone evolution, and then present case study of industrial application. In case study, we confirmed that the proposed system suggested two unintentionally developed clones in a half of the month.

A pupil filtering lens system for improving depth of focus and resolution is introduced. The effectiveness of the pupil filtering lens system, which uses the Super-FLEX filter for window patterns and a high spatial frequency enhancing filter for periodical patterns, is discussed. Using these filters, it is possible to achieve 0.2-0.3p.m patterns without phase-shift masks. The depth of focus and the practical resolution are compared for various super-resolution optical lithography methods. Preliminary experimental results from the pupil filtering lens were obtained, and the effect of the super-FLEX filter is confirmed.