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The purpose of this study is to provide a novel concept design for complementary metal oxide semiconductor (CMOS) capacitive Zdirection accelerometers. In this design, capacitance-sensing parallel plates and thin single-metal-layer springs are fabricated by chemical plasma etching. This plasma etching process utilizes a rough vacuum to shorten the mean free path of the reactive gases and increase lateral etching and undercut. Moreover, the thin single-metal-layer springs have the characteristic of a lower spring constant to increase the displacement of the proof mass. Thus, the sensitivity can be further improved. This study has established a post-CMOS chemical plasma etching process to release the accelerometer using sensing electrodes of the capacitance-sensing parallel plates. The Z -direction accelerometer has been fabricated by the standard CMOS 0.35 mm two-polycrystalline silicon four-metal (2P4M) process and a post-CMOS process of chemical plasma etching. The measurement results indicate that the sensitivity of the accelerometer is about 0.8 mV/g and the total noise floor is 4.2 mV/ ffiffiffiffiffiffi Hz p .

Backlight modules with inclined groove-based microstructures, such as V-cuts for liquid crystal display (LCD) applications, have been developed. This study presents a novel photolithography technology which utilizes an inclined exposure method. An inclined microstructure surface fabricated with a controlled optical path is exposed using refracted ultraviolet (UV) light. A weight-bearing point of inclined exposure uses an optical element prism which is placed between the UV light source and the photoresist. This approach utilizes a prism-based exposure which complies with Snell's law. Different from conventional photolithography, the angle needed and the smooth surfaces of microstructures fabricated using this approach can be easily controlled. The aim of this study is to fabricate inclined groove-based microstructures on optical film to form structures ranging from 30 to 90 . This research made use of microstructure plates with dimensions of 30 Â 30 mm 2 and with surface roughness less than 20 nm. The results from this study could provide an important foundation of knowledge for the fabrication of next-generation displays.