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The SiO 2 xerogel thin films were deposited successfully by sol-gel technique via the acid-catalyzed hydrolysis and condensation of tetraethylorthosilicate (TEOS) with ethanol as a solvent. Further, the deposited thin films were treated wet chemically by trimethylchlorosilane (TMCS) and hexane solution with 10% and 15% volume ratio to remove the hydroxyl groups from the surface of deposited SiO 2 thin films. These as deposited and surfacemodified films were characterized by ellipsometer, Fourier transform infrared (FTIR) spectrometer and contact angle meter. The presence of 2900 and 850 cm −1 peaks of CH 3 vibrations in FTIR spectra of surface-modified films confirms the hydrphobisation of SiO 2 surface. The maximum contact angle of 108•7 • was observed for the surface-modified film at 10% TMCS.

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