Abshrt. We present the recent status of inelasticity in high-energy hadronic reactions, In particular, we elucidate some points concerning the energy dependence of inelasticity emerging from cosmic ray data.

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This paper investigates a control scheme for tracking the dynamic shapes of structures with limited numbers of voltage channels. Integrated design optimization of voltage channel distribution and control parameters for structural dynamic shape control is formulated as an optimization problem with discrete variables and continuous variables coexisting. A two-level optimization method based on a simulated annealing algorithm is proposed. In the first level, the optimum channel distribution is determined by optimizing the objective function which is the optimal value obtained in the second level. The optimum control parameters are obtained by using a sequential linear least-squares algorithm in the second level. The effectiveness of the present design methodology and optimization scheme is then demonstrated through numerical examples for tracking the dynamic shapes of composite plates.

We consider spectroscopies of strongly interacting atomic gases, and we propose a model for describing the coupling between quasiparticles and gapless phonon-like modes. Our model explains features in a wide range of different experiments in both fermionic and bosonic atom gases in various spectroscopic methods.

The chemical amplification resist system of composed of partially tBOC-protected PVP, a dissolution inhibitor, and an acid generator are investigated as EB resists. As dissolution inhibitors, hydroquinone protected with tert-butoxycarbonyl group (B-HQ) and isophthalic acid protected with tenbutyl group (B-IP) are utilized. It is found that dissolution rate of the resist consisting of B-IP is faster than that of B-HQ in the exposed area. B-HQ and B-as dissolution inhibitors convert into HQ and IP as dissolution promoters after exposure, respectively. The pKa of B? is smaller than that of HQ. It is considered that the acidity of JP is higher than that of HQ, so the ability of the dissolution promotion of IP is much larger than that of HQ. IP enhances the solubiity of the matrix resin to the alkaline developer larger than HQ. The resist consisting of B-JP has a high dissolution rate ratio between the exposed and unexposed areas, so it is considered that it results in a much improved pattern profile. A 0. 14 p.m linesand-spaces pattern is successfully fabricated at 17.5 pC/cm2 using 50keV. EB.