Multilayer films exhibit high saturation magnetization, high permeability, and high cutoff frequency fr, applying to magnetic inductors that satisfy both high frequency, miniaturization, and integration. In this work, we fabricate Fe/Ni81Fe19/Fe (t/100/t nm) multilayer films on Si (100) using electron beam evaporation, and investigate the Fe thickness dependence of surface morphology, saturation magnetization, coercivity, and ferromagnetic resonance fr. The results demonstrate that Fe/Ni81Fe19/Fe (4/100/4 nm) multilayer film possess relatively high saturation magnetization (12.1 kGs), low coercivity (3.1 Oe), and high ferromagnetic resonance fr (1.93 GHz).