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Surface texturation of multicrystalline using laser etching is studied. Symmetrical microstructure for light trapping was made by using laser etching followed by chemical post-processing. The surface morphology, reflection rate and life time of minority carrier in multicrystalline silicon wafer were measured and analyzed. The lowest reflection of the processed silicon surface can be reduced to about 10%. There are unsolved problems, such as laser-induced damage and long processing time, but this technology has provided an efficient way to improve performance of multicrystalline solar cell.