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The influence of O 2 -plasma treatment on H 2 post-treated BZO (ZnO:B) thin film using MOCVD (Metal-Organic Chemical Vapor Deposition) are investigated. An O 2 -plasma treatment of the H 2 post-treated BZO thin films resulted in XRD peak of (100), ( 101) and (110). Also, electrical properties resulted in an increase in sheet resistance and work function. The weighted optical transmittance and haze at 300∼1,100 nm of BZO thin films with O 2 -plasma treatment on the H 2 post-treatment show approximately 86% and 15%, respectively.