62.4: The Structure and Manufacturing Process of Large Area Transparent Electrowetting Display

Ku, Yun-Sheng; Kuo, Shu‐Wei; Tsai, Yu‐Hsiang; Cheng, Pei-Pei; Chen, Jian-Lung; Lan, Kai-Wei; Lo, Kuang Yao; Lee, Kuo‐Chang; Cheng, Wei-Jen

doi:10.1002/j.2168-0159.2012.tb05919.x

Cited by 12 publications

(12 citation statements)

References 6 publications

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“…High viscous photoresists 13 , 15 , 17 , 18 are possible to be coated on fluoropolymer directly. The hydrophobicity was not compromised in this way, however, coating results of the resist was not satisfying 14 , 19 . Photoresist at the edge area of the wafer shrinks towards the center during soft bake of it, which results in serious edge bead and leaving a relatively large blank edge area without resist 14 .…”

Section: Introductionmentioning

confidence: 96%

“…FluoroN of Cytonix Corp 13 . or Zonyl ® FSN 15 ) or oxygen plasma 14 , 20 were employed to treat the fluoropolymer, which allows the SU-8 to be spin coated on the fluoropolymer surface with pretty good coverage. However, either the surface hydrophobicity was found to be degraded 14 , 15 , 20 or the adhesion was still not good enough 13 , 17 , 18 .…”

Section: Introductionmentioning

confidence: 99%

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A sacrificial layer strategy for photolithography on highly hydrophobic surface and its application for electrowetting devices

Zhang

Yan

et al. 2017

Sci Rep

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Patterning micro-structures on highly hydrophobic surface by photolithography is usually inevitable for fabricating devices based on electrowetting effects. The key challenges for such photolithography processes are how to coat photoresist uniformly and maintain the hydrophobicity of the highly hydrophobic surface, which are usually two contradict aspects. Moreover, the patterned microstructure must adhere to the highly hydrophobic surface excellently, which is critical for device application. However, a simple and robust fabrication process that fulfills all the above requirements was seldom reported. In this paper, we developed a sacrificial layer photolithography strategy on highly hydrophobic surface. Photoresist is easily coated uniformly all over the substrate by introducing a sacrificial layer between the photoresist and the highly hydrophobic surface. The hydrophobicity of the exposed hydrophobic surface was maintained and the adhesion of the microstructures to the substrate is excellent. An electrowetting display sample was demonstrated by this fabrication strategy, which showed dynamic image displaying with response time less than 40 ms. The strategy is applicable to both rigid and flexible substrate and manufacturing compatible. We believe our developed photolithography process is important for research and development of devices based on electrowetting effect.

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Section: Introductionmentioning

confidence: 96%

Section: Introductionmentioning

confidence: 99%

A sacrificial layer strategy for photolithography on highly hydrophobic surface and its application for electrowetting devices

Zhang

Yan

et al. 2017

Sci Rep

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“…Project technology, liquid crystal displays (LCD), electrowetting displays (EWD), projectors, organic light emitting diodes (OLED), and other technologies are typically adopted to create transparent displays [9][10][11][12][13][14][15][16]. In project technology, information is projected onto a transflective screen, and the user can combine this display information with the real image behind the screen.…”

Section: Introductionmentioning

confidence: 99%

Image quality affected by diffraction of aperture structure arrangement in transparent active-matrix organic light-emitting diode displays

et al. 2015

Self Cite

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Transparent display is one of the main technologies in next-generation displays, especially for augmented reality applications. An aperture structure is attached on each display pixel to partition them into transparent and black regions. However, diffraction blurs caused by the aperture structure typically degrade the transparent image when the light from a background object passes through finite aperture window. In this paper, the diffraction effect of an active-matrix organic light-emitting diode display (AMOLED) is studied. Several aperture structures have been proposed and implemented. Based on theoretical analysis and simulation, the appropriate aperture structure will effectively reduce the blur. The analysis data are also consistent with the experimental results. Compared with the various transparent aperture structure on AMOLED, diffraction width (zero energy position of diffraction pattern) of the optimize aperture structure can be reduced 63% and 31% in the x and y directions in CASE 3. Associated with a lenticular lens on the aperture structure, the improvement could reach to 77% and 54% of diffraction width in the x and y directions. Modulation transfer function and practical images are provided to evaluate the improvement of image blurs.

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“…However, there are still many defects in EWDs, such as oil splitting, oil backflow, charge trapping, hysteresis effect, etc. [10,11]. In order to solve these defects and further improve the optical performance of EWDs, many scholars have made a lot of efforts.…”

Section: Introductionmentioning

confidence: 99%

A Multi Waveform Adaptive Driving Scheme for Reducing Hysteresis Effect of Electrowetting Displays

Wang

Henzen

2020

Front. Phys.

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Electrowetting display (EWD) is a new reflective display technology, which has the advantages of ultra-low power consumption, high contrast, fast response and full-color. However, due to a hysteresis effect, accurate gray scale display of EWDs cannot be achieved, which seriously restricted the display effect and performance of EWDs. In order to reduce the influence of hysteresis effect, a multi waveform adaptive driving scheme was proposed in this paper. Firstly, a multi waveform driving system was designed and implemented by a STM32 master chip and an AD5304 driver chip. The driving system could automatically select different driving waveforms according to the preset switching conditions. Then, different driving waveforms were designed and implemented according to different driving stages of EWDs. Finally, driving waveforms were mapped with each stage of the driving process one by one to realize the adaptive driving of multiple waveforms. The experimental results showed that, compared with the conventional square wave, the maximum hysteresis difference of hysteresis curve could be reduced by 39.19% with the multi waveform driving scheme.

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62.4: The Structure and Manufacturing Process of Large Area Transparent Electrowetting Display

Cited by 12 publications

References 6 publications

A sacrificial layer strategy for photolithography on highly hydrophobic surface and its application for electrowetting devices

A sacrificial layer strategy for photolithography on highly hydrophobic surface and its application for electrowetting devices

Image quality affected by diffraction of aperture structure arrangement in transparent active-matrix organic light-emitting diode displays

A Multi Waveform Adaptive Driving Scheme for Reducing Hysteresis Effect of Electrowetting Displays

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