a-C:H films deposited in the plasma of barrier and surface discharges at atmospheric pressure

Bugaev, S. P.; Коротаев, А. Д.; Оскомов, К. В.; Сочугов, Н. С.

doi:10.1016/s0257-8972(97)00000-5

Cited by 36 publications

(15 citation statements)

References 8 publications

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“…In fact, homogeneous pulsed DBD have been observed in helium as carrier gas39, 40 or with very short pulses (10–100 ns) 41, 42. Other conditions lead to filamentary discharges 43–47. Nanorepetitive pulsed discharge (NRPD) is a promising solution for PECVD.…”

Section: Discharge Regimes and Energetic Speciesmentioning

confidence: 99%

Atmospheric Pressure Low Temperature Direct Plasma Technology: Status and Challenges for Thin Film Deposition

Massines

Sarra-Bournet

Fanelli

et al. 2012

Plasma Processes & Polymers

310

327

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Over the last ten years, expansion of atmospheric pressure plasma solutions for surface treatment of materials has been remarkable, however direct plasma technology for thin film deposition needs still great effort. The objective of this paper is to establish the state of the art on scientific and technologic locks, which have to be opened to consider direct atmospheric pressure plasma‐enhanced chemical vapor deposition (AP‐PECVD) a viable option for industrial application. Basic scientific principles to understand and optimize an AP‐PECVD process are summarized. Laboratory reactor configurations are reviewed. Reference points for the design and use of AP‐PECVD reactors according to the desired thin film properties are given. Finally, solutions to avoid powder formation and to increase the thin film growth rate are discussed.

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Section: Discharge Regimes and Energetic Speciesmentioning

confidence: 99%

Atmospheric Pressure Low Temperature Direct Plasma Technology: Status and Challenges for Thin Film Deposition

Massines

Sarra-Bournet

Fanelli

et al. 2012

Plasma Processes & Polymers

310

327

View full text Add to dashboard Cite

show abstract

“…Many other studies have been reported in the scientific literature22–30 concerning hydrocarbon deposition in DBDs from several monomers and gas mixtures, frequently in a filamentary regime. In particular, Goossens et al24,25 studied ethylene deposition in mixtures with helium or argon.…”

Section: Introductionmentioning

confidence: 99%

Deposition of Hydrocarbon Films by Means of Helium‐Ethylene Fed Glow Dielectric Barrier Discharges

Fanelli

Fracassi

d’Agostino

2005

Plasma Processes & Polymers

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Summary: The present work provides a detailed study of helium‐ethylene dielectric barrier glow discharges. The effect of ethylene concentration, total gas flow rate, excitation frequency and applied voltage have been investigated in order to clarify both discharge operational mode, and coating composition. The discharge has been characterized by means of electrical measurements and optical emission spectroscopy, while the stable species contained in the gas effluent have been sampled and analyzed using gas chromatography with mass spectrometry detection to achieve indications on the reactive fragments generated inside the discharge. It has been observed that polyethylene‐like coatings can be obtained for a wide range of electrical conditions, and the deposition rates have been found to range between 20 and 80 nm · min−1.

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“…The bands at 2872 cm −1 , 2930 cm −1 and 2959 cm −1 are related to sp 3 CH 3 symmetric, superimposing of sp 3 CH 2 asymmetric and sp 3 C–H mode, and sp 3 CH 3 asymmetric C–H vibrations, respectively [ 26 , 29 , 30 , 31 ]. The relative absorbance of these bands is much higher than for DLC films [ 31 , 32 , 33 , 34 ]. The C 2 H 6 /Ar film shows the strongest absorption near 2900 cm −1 and consequently the highest sp 3 CH 3 configuration compared to the other two films.…”

Section: Resultsmentioning

confidence: 99%

Spectroscopic Study of Plasma Polymerized a-C:H Films Deposited by a Dielectric Barrier Discharge

et al. 2016

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Plasma polymerized a-C:H thin films have been deposited on Si (100) and aluminum coated glass substrates by a dielectric barrier discharge (DBD) operated at medium pressure using C2Hm/Ar (m = 2, 4, 6) gas mixtures. The deposited films were characterized by Fourier transform infrared reflection absorption spectroscopy (FT-IRRAS), Raman spectroscopy, and ellipsometry. FT-IRRAS revealed the presence of sp3 and sp2 C–H stretching and C–H bending vibrations of bonds in the films. The presence of D and G bands was confirmed by Raman spectroscopy. Thin films obtained from C2H4/Ar and C2H6/Ar gas mixtures have ID/IG ratios of 0.45 and 0.3, respectively. The refractive indices were 2.8 and 3.1 for C2H4/Ar and C2H6/Ar films, respectively, at a photon energy of 2 eV.

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a-C:H films deposited in the plasma of barrier and surface discharges at atmospheric pressure

Cited by 36 publications

References 8 publications

Atmospheric Pressure Low Temperature Direct Plasma Technology: Status and Challenges for Thin Film Deposition

Atmospheric Pressure Low Temperature Direct Plasma Technology: Status and Challenges for Thin Film Deposition

Deposition of Hydrocarbon Films by Means of Helium‐Ethylene Fed Glow Dielectric Barrier Discharges

Spectroscopic Study of Plasma Polymerized a-C:H Films Deposited by a Dielectric Barrier Discharge

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