A comparative study of the growth dynamics and tribological properties of nanocrystalline diamond films deposited on the (110) single crystal diamond and Si(100) substrates

Podgursky, Vitali; Bogatov, Andrei; Yashin, Maxim; Viljus, Mart; Bolshakov, A. P.; Седов, В. С.; Volobujeva, Olga; Mere, Arvo; Raadik, T.; Ralchenko, V.G.

doi:10.1016/j.diamond.2018.12.024

Cited by 25 publications

(10 citation statements)

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“…Raman spectra ( Figure 10) taken on the native surface of the NCD and Al 2 O 3 /NCD films after the tests at different temperatures are similar to ones investigated in our previous studies of the NCD films [5,12,13]. The main peak positions are as follows: 1336 cm −1 (diamond), 1366 cm −1 (D band), 1549 cm −1 (G band), 1135 cm −1 , and 1480 cm −1 (t-Pa, trans-polyacetylene).…”

Section: Resultssupporting

confidence: 69%

“…The XRD pattern taken in grazing incident mode from the as-deposited Al 2 O 3 /NCD film is shown in Figure 2. The peak positions are similar to the reflections from the NCD film investigated in our previous study of the NCD films grown on Si(100) and (110) single crystal diamond [12,13]; no peaks corresponding to Si and β-SiC were observed due to grazing incident set-up. The Al 2 O 3 layer prepared at low temperature is amorphous [14][15][16].…”

Section: Methodssupporting

confidence: 78%

“…In the case of Al2O3/NCD and A-Al2O3/NCD films, a decrease of the wear scar width for the tests at 450 °C in contrast to ones at RT and 300 °C can be observed. However, the depth of the wear scars is higher after the tests at 450 °C for all types of samples, which can be explained by the increase of the wear as well as by surface deflection [13,17]. for the later stage of sliding at RT can be attributed to contact between the ball and alumina layer, which survived on the borders of the wear scar (Figure 5c,d).…”

Section: Resultsmentioning

confidence: 94%

“…Therefore, the high COF value observed for Al2O3/NCD and A-Al2O3/NCD samples (Figure 3a) for the later stage of sliding at RT can be attributed to contact between the ball and alumina layer, which survived on the borders of the wear scar (Figure 5c,d). The deflection of the NCD film can lead to a loss of contact between the ball and the central part of the wear scar [13,17].…”

Section: Methodsmentioning

confidence: 99%

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High Temperature Tribological Properties of Al2O3/NCD Films Investigated Under Ambient Air Conditions

et al. 2020

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Comparative analysis of dry sliding wear behavior of nanocrystalline diamond (NCD) films and NCD films coated with a thin Al 2 O 3 layer (Al 2 O 3 /NCD) is the main goal of the present study. Plasma-enhanced chemical vapor deposition (PECVD) and atomic layer deposition (ALD) methods were used to prepare the NCD and alumina films, respectively. Sliding wear tests were conducted at room temperature (RT), 300 and 450 • C in air. Independent of type of specimen, superlubricating behavior with the coefficient of friction (COF) in the range of 0.004-0.04 was found for the tests at 300 • C. However, the COF value measured on the Al 2 O 3 /NCD films in the tests at 450 • C is lower than that for the NCD film. A relatively short run-in period and a stable COF value of about 0.15 were observed at this temperature for the Al 2 O 3 /NCD films. The width of the wear scars measured on the Al 2 O 3 /NCD films after the tests at 450 • C is significantly smaller in comparison with the NCD film. The apparent wear volume of the wear scar on the NCD film tested at 450 • C was noticeably higher than that on the Al 2 O 3 /NCD films.

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Section: Resultssupporting

confidence: 69%

Section: Methodssupporting

confidence: 78%

Section: Resultsmentioning

confidence: 94%

Section: Methodsmentioning

confidence: 99%

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High Temperature Tribological Properties of Al2O3/NCD Films Investigated Under Ambient Air Conditions

et al. 2020

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“…The NCD films (samples n2–n9) were grown on the SCD(110) substrates using the microwave plasma-enhanced chemical vapor deposition (MW-PECVD) method, see details in our previous study [ 28 ]. The coating thickness was 2.2 (samples n4 and n5), 8 (n6 and n7), 10.5 (n2 and n3), 14 (n9) and 22.5 µm (n8), respectively ( Table 1 ).…”

Section: Methodsmentioning

confidence: 99%

Transition from Self-Organized Criticality into Self-Organization during Sliding Si3N4 Balls against Nanocrystalline Diamond Films

Bogatov

Podgursky

Vägiström

et al. 2019

Entropy

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The paper investigates the variation of friction force (Fx) during reciprocating sliding tests on nanocrystalline diamond (NCD) films. The analysis of the friction behavior during the run-in period is the focus of the study. The NCD films were grown using microwave plasma-enhanced chemical vapor deposition (MW-PECVD) on single-crystalline diamond SCD(110) substrates. Reciprocating sliding tests were conducted under 500 and 2000 g of normal load using Si3N4 balls as a counter body. The friction force permanently varies during the test, namely Fx value can locally increase or decrease in each cycle of sliding. The distribution of friction force drops (dFx) was extracted from the experimental data using a specially developed program. The analysis revealed a power-law distribution f-µ of dFx for the early stage of the run-in with the exponent value (µ) in the range from 0.6 to 2.9. In addition, the frequency power spectrum of Fx time series follows power-law distribution f-α with α value in the range of 1.0–2.0, with the highest values (1.6–2.0) for the initial stage of the run-in. No power-law distribution of dFx was found for the later stage of the run-in and the steady-state periods of sliding with the exception for periods where a relatively extended decrease of coefficient of friction (COF) was observed. The asperity interlocking leads to the stick-slip like sliding at the early stage of the run-in. This tribological behavior can be related to the self-organized criticality (SOC). The emergence of dissipative structures at the later stages of the run-in, namely the formation of ripples, carbonaceous tribolayer, etc., can be associated with the self-organization (SO).

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Nitrogen‐Induced Microcrystalline‐to‐Nanocrystalline Structure Transition in Diamond Films Grown by Microwave Plasma Chemical Vapor Deposition: Comparison of N₂ and NH₃ Precursors

Martyanov,

Tiazhelov,

Voronov

et al. 2024

Physica Status Solidi (a)

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The structure and properties of polycrystalline chemical vapor deposition (CVD) diamond coatings grown by microwave plasma CVD in H2–CH4 mixtures can be effectively controlled by nitrogen admixture in the process gas. Here, a comparative study of adding nitrogen from different precursors, N2 and ammonia NH3, in concentrations up to 0.4%vol on grain size, texture, surface roughness, and sp2/sp3 ratio of the produced films on Si substrates is performed. A transition from microcrystalline to smooth nanocrystalline diamond structure is found to occur at a certain concentration of the precursor, for NH3 this threshold concentration being much lower, 0.02–0.1%, than for N2. The higher activity of ammonia is associated with easier formation of cyano radicals in the plasma as detected with optical emission spectroscopy, in accord with the lower bond‐dissociation energy for NH3 compared to N2. On the contrary, a smaller addition (0.004%) of either N2 or NH3 promotes almost doubling of the growth rate, while preserving the microcrystalline structure of the film. The results establish ammonia as a convenient alternative precursor to commonly used N2 added in the plasma for the diamond film structure modifications.

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A comparative study of the growth dynamics and tribological properties of nanocrystalline diamond films deposited on the (110) single crystal diamond and Si(100) substrates

Cited by 25 publications

References 39 publications

High Temperature Tribological Properties of Al2O3/NCD Films Investigated Under Ambient Air Conditions

High Temperature Tribological Properties of Al2O3/NCD Films Investigated Under Ambient Air Conditions

Transition from Self-Organized Criticality into Self-Organization during Sliding Si3N4 Balls against Nanocrystalline Diamond Films

Nitrogen‐Induced Microcrystalline‐to‐Nanocrystalline Structure Transition in Diamond Films Grown by Microwave Plasma Chemical Vapor Deposition: Comparison of N₂ and NH₃ Precursors

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A comparative study of the growth dynamics and tribological properties of nanocrystalline diamond films deposited on the (110) single crystal diamond and Si(100) substrates

Cited by 25 publications

References 39 publications

High Temperature Tribological Properties of Al2O3/NCD Films Investigated Under Ambient Air Conditions

High Temperature Tribological Properties of Al2O3/NCD Films Investigated Under Ambient Air Conditions

Transition from Self-Organized Criticality into Self-Organization during Sliding Si3N4 Balls against Nanocrystalline Diamond Films

Nitrogen‐Induced Microcrystalline‐to‐Nanocrystalline Structure Transition in Diamond Films Grown by Microwave Plasma Chemical Vapor Deposition: Comparison of N2 and NH3 Precursors

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Nitrogen‐Induced Microcrystalline‐to‐Nanocrystalline Structure Transition in Diamond Films Grown by Microwave Plasma Chemical Vapor Deposition: Comparison of N₂ and NH₃ Precursors