2003
DOI: 10.1016/s0168-583x(02)01996-1
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A hollow cathode discharge modification as a source of sputtered atoms and their ions

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Cited by 15 publications
(11 citation statements)
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“…Electrons trapped in the hollow cathode were accelerated toward the anode, leading to efficient electronic excitation and ionization. The HCD plasma source has been applied in analytical and material science . The most successful application of HCD in mass spectrometry (MS) is the proton transfer reaction mass spectrometry (PTR‐MS) technique originally developed by Lindinger et al .…”
mentioning
confidence: 99%
“…Electrons trapped in the hollow cathode were accelerated toward the anode, leading to efficient electronic excitation and ionization. The HCD plasma source has been applied in analytical and material science . The most successful application of HCD in mass spectrometry (MS) is the proton transfer reaction mass spectrometry (PTR‐MS) technique originally developed by Lindinger et al .…”
mentioning
confidence: 99%
“…Many attempts have been made to understand the processes occurring in the HCD since Friedrich Paschen's pioneering work in 1916 [29][30][31][32][101][102][103][104][105][106][107][108][109][110][111][112][113][114][115][116][117][118]. Despite the fact that the hollow cathode effect and conventional glow discharge (GD) are two distinct electrical processes, some of their properties were assumed to be the same.…”
Section: Hcd Versus Conventional Gdmentioning
confidence: 99%
“…Hollow cathodes are used in a wide variety of applications: as efficient light sources [23], as sources of electrons [207][208][209][210][211][212][213] to generate excited species for elemental analysis [1,152,183,214], as ion sources [3,199,[215][216][217][218][219], for nitriding [220][221][222][223], space propulsion [224][225][226], vacuum welding [227], basic plasma research [228,229], cluster formation [230] and plasma-activated pre-treatment and coating processes [231][232][233] among others.…”
Section: Use Of Hollow Cathodes In the Synthesis Of Thin Filmsmentioning
confidence: 99%