Abstract:In recent years, circuit integration and density of semiconductor devices are rapidly increased by the advance of manufacturing technology. SEM is in a common wide use for the evaluation of semiconductor processes in the product fabrication. However, the observation by using SEM has become gradually difficult because of smaller design rules. Accordingly, a new high-resolution electron microscope having the functions of TEM, STEM and SE (Secondary Electron) image is required. It is possible to easily observe fo… Show more
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