1994
DOI: 10.1016/0167-9317(94)90145-7
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A new operating regime for electroplating the gold absorber on x-ray masks

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Cited by 28 publications
(23 citation statements)
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“…The release of free cyanide during the reduction of [Au(CN) 2 ] À can be incompatible with positive photoresists used in the microelectronics industry [41,42]. It has also been found that the residual stress of the plated gold can be controlled in noncyanide baths [43,44]. Low-stress deposits are of particular interest for X-ray lithography masks because they must be thin, flat, and made from high-atomic-number elements.…”
Section: Noncyanide Bathsmentioning
confidence: 99%
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“…The release of free cyanide during the reduction of [Au(CN) 2 ] À can be incompatible with positive photoresists used in the microelectronics industry [41,42]. It has also been found that the residual stress of the plated gold can be controlled in noncyanide baths [43,44]. Low-stress deposits are of particular interest for X-ray lithography masks because they must be thin, flat, and made from high-atomic-number elements.…”
Section: Noncyanide Bathsmentioning
confidence: 99%
“…For example, Figure 4.6 shows the stress change from compressive to tensile as the temperature or current is raised. Thallium was used as the stressreducing agent at concentrations up to 80 ppm, a value that can be more easily maintained than the low-thallium-concentration baths [43]. Alkaline sulfite baths can also be used without the use of thallium, which itself is a health hazard [44].…”
Section: Noncyanide Bathsmentioning
confidence: 99%
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“…The high-quality gold film deposition from a solution with a trace amount of As(III) was reported later [6], and gold film with superior properties was described. Recently a number of processes based on gold reduction from sulfite were formulated to obtain gold films suitable for X-ray lithography and microtechnical devices [7][8][9][10].…”
Section: Introductionmentioning
confidence: 99%