A New Plasma Resistant Coating Reducing Particle Generations

Kiyohara, Masakatsu; Hatono, Hironori; Iwasawa, Junichi

doi:10.3131/jvsj2.53.573

Cited by 6 publications

(2 citation statements)

References 6 publications

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“…They damage plant roots, hinder the absorption of nutrients, cause leaves to turn yellow, and even cause plant death [6, 7]. The highly transmitted Bursaphelenchus xylophilus is the most severe nematode of Bursaphelenchus spp., which has spread to Europe and Asia [8–10]. B. xylophilus is extremely fertile, and each female can produce approximately 100 eggs, and can develop from first‐stage juveniles ( J 1 ) to fourth‐stage juveniles ( J 4 ) in less than one week [11].…”

Section: Introductionmentioning

confidence: 99%

Recent research progress of heterocyclic nematicidal active compounds

Wang

Luo

Chen

et al. 2023

Journal of Heterocyclic Chem

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Plant‐parasitic nematodes cause huge economic losses of $ 157 billion to world agriculture annually. Long‐term use of traditional nematicides can lead to increased resistance of nematode and reduced control effectiveness. New effective and safe nematicides are needed to replace the organophosphorus and carbamate. Heterocyclic compounds play an important role in nematicide discovery. For example, the new nematicides fluenesulfone, fluopyram, cyclobutrifluram, tioxazafen, imicyafos, and fluazaindolizine have at least one heterocyclic ring in their structures. In view of the importance of heterocyclic structure in the development of nematicides, this paper reviews the research progress of nematicidal active compounds of heterocyclic in recent years, and discusses the structure–activity relationship (SAR) and mechanism of action. It is hoped that it can provide new inspiration for the development of new nematicides.

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Section: Introductionmentioning

confidence: 99%

Recent research progress of heterocyclic nematicidal active compounds

Wang

Luo

Chen

et al. 2023

Journal of Heterocyclic Chem

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“…In high aspect ratio processing, since the RIE process needs a high RF power, there is concern about damage to the chamber wall in the RIE equipment. [1][2][3] In order to solve this problem, Y 2 O 3 coating by atmospheric plasma spraying (APS) is widely used as a protective material for the inner wall of the chamber because of its high plasma resistance. However, the APS coating exposed to plasma generates cracks and voids at the surface and inside.…”

mentioning

confidence: 99%

Improvement of Process Reproducibility and Particle Reduction for YF₃ Coating by Collision Assisted Sintering Process in Reactive Ion Etching

Matsumoto¹,

Saito

Homma

2020

ECS J. Solid State Sci. Technol.

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In reactive ion etching process, generation of particles and deterioration in process reproducibility due to high aspect ratio processing have become problems. In this study, YF 3 coating was investigated using collision assisted sintering process (CASP) technique to reduce particles and improve process reproducibility. It was clarified that the CASP had possibility of a high-density coating with fewer cracks and voids than atmospheric plasma spraying (APS) coating. The amount of etching and surface roughness reduced to 92% and 31%, respectively, as compared to APS coating. The surface polishing for the APS-YF 3 coating also reduced the amount of etching by 4%, and the CASP-YF 3 /APS-Y 2 O 3 structural coating reduces desorption rate of particles by 25%. These results suggested that the possibility of suppressing particle generation and improving process reproducibility due to a high-density coating.

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Halogen plasma erosion resistance of rare earth oxide films deposited on plasma sprayed alumina coating by aerosol deposition

Jung¹,

Hahn²,

Yoon³

et al. 2012

Journal of the European Ceramic Society

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A New Plasma Resistant Coating Reducing Particle Generations

Cited by 6 publications

References 6 publications

Recent research progress of heterocyclic nematicidal active compounds

Recent research progress of heterocyclic nematicidal active compounds

Improvement of Process Reproducibility and Particle Reduction for YF₃ Coating by Collision Assisted Sintering Process in Reactive Ion Etching

Halogen plasma erosion resistance of rare earth oxide films deposited on plasma sprayed alumina coating by aerosol deposition

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A New Plasma Resistant Coating Reducing Particle Generations

Cited by 6 publications

References 6 publications

Recent research progress of heterocyclic nematicidal active compounds

Recent research progress of heterocyclic nematicidal active compounds

Improvement of Process Reproducibility and Particle Reduction for YF3 Coating by Collision Assisted Sintering Process in Reactive Ion Etching

Halogen plasma erosion resistance of rare earth oxide films deposited on plasma sprayed alumina coating by aerosol deposition

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Improvement of Process Reproducibility and Particle Reduction for YF₃ Coating by Collision Assisted Sintering Process in Reactive Ion Etching