Metrology, Inspection, and Process Control for Microlithography XVIII 2004
DOI: 10.1117/12.536047
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A novel and robust method for the accurate magnification characterization and calibration of out-of-fab SEM cluster tools

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“…As a result, there is a shift in the image points w.r.t in their projection model, which in turn decomposes into drift and distortion (Maune 1976;Mizuno et al 1997;Santo et al 2002;Sutton et al 2006;Charlot et al 2008;Vignon et al 2001;Sinram et al 2002;Cornille, 2005;Mizuno et al 1997;Sicignano et al 2004). Most of these works address the calibration of the projection and the distortion, and has very little to do with the calibration of drift.…”
Section: Related Workmentioning
confidence: 99%
“…As a result, there is a shift in the image points w.r.t in their projection model, which in turn decomposes into drift and distortion (Maune 1976;Mizuno et al 1997;Santo et al 2002;Sutton et al 2006;Charlot et al 2008;Vignon et al 2001;Sinram et al 2002;Cornille, 2005;Mizuno et al 1997;Sicignano et al 2004). Most of these works address the calibration of the projection and the distortion, and has very little to do with the calibration of drift.…”
Section: Related Workmentioning
confidence: 99%