2013
DOI: 10.1007/s00542-013-1903-z
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A novel method to overcome photoresist collapse with high aspect ratio structures

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“…One such problem is the collapse of nanostructures due to capillary interactions during evaporation of cleaning solutions, a process that is exacerbated by increasing miniaturization of semiconductor devices and consequent weakening of nanostructures. The collapse of nanostructures destroys their expected functions, so countermeasures are essential. To solve this problem, new drying techniques to prevent collapse have been developed, such as the addition of an auxiliary substrate, the use of a liquid with a low surface tension to control the wettability of the substrate, , the reduction of capillary forces by electromagnetic-wave irradiation, or the elimination of capillary forces by drying without the involvement of a liquid phase through sublimation or supercriticality. , However, no effective solution has yet been established, and this problem might be one factor that makes it impossible to maintain Moore’s law.…”
Section: Introductionmentioning
confidence: 99%
“…One such problem is the collapse of nanostructures due to capillary interactions during evaporation of cleaning solutions, a process that is exacerbated by increasing miniaturization of semiconductor devices and consequent weakening of nanostructures. The collapse of nanostructures destroys their expected functions, so countermeasures are essential. To solve this problem, new drying techniques to prevent collapse have been developed, such as the addition of an auxiliary substrate, the use of a liquid with a low surface tension to control the wettability of the substrate, , the reduction of capillary forces by electromagnetic-wave irradiation, or the elimination of capillary forces by drying without the involvement of a liquid phase through sublimation or supercriticality. , However, no effective solution has yet been established, and this problem might be one factor that makes it impossible to maintain Moore’s law.…”
Section: Introductionmentioning
confidence: 99%