A picosecond widely tunable deep-ultraviolet laser for angle-resolved photoemission spectroscopy

Zhang, Fengfeng; Yang, Feng; Zhang, Shenjin; Xu, Zhi; Wang, Zhimin; Xu, Feng-Liang; Peng, Qinjun; Zhang, Jingyuan; Wang, Xiaoyang; Chen, Chuangtian; Xu, Zuyan

doi:10.1088/1674-1056/22/6/064212

Cited by 5 publications

(1 citation statement)

References 24 publications

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“…Such a high pulse energy and high peak power ps laser at kHz PRR will be useful for high efficiency second harmonic generation to produce a ps 532 nm green source, which could find important applications in satellite laser ranging and laser ablation of human tissue in medical surgery. Furthermore, this ps amplifier could be a promising candidate for efficient nonlinear frequency conversion to the deep-ultraviolet [24,25] and mid-infrared laser sources [26].…”

Section: Discussionmentioning

confidence: 99%

8.2 mJ, 324 MW, 5 kHz picosecond MOPA system based on Nd:YAG slab amplifiers

Chen

Liu

Yang

et al. 2016

J. Opt.

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We have demonstrated a high pulse energy, high peak power, and high beam quality picosecond (ps) master oscillator power amplifier system of 1064 nm at a pulse repetition rate of 5 kHz. This system consisted of a ps mode-locked oscillator, a regeneration amplifier, and three-stage Nd:YAG slab amplifiers, which enabled us to manage good thermal issues and provide an average power of 41 W. Up to 8.2 mJ of energy per pulse was achieved at the total absorbed pump power of 460 W with an average extraction efficiency of 8.5%. The pulse duration was 25.3 ps, which corresponds to a peak power of 324 MW. The beam quality factors of M2 were measured to be along the x axis direction and along the y axis direction, respectively, and the corresponding brightness was as high as 5.88 × 108 W cm−2 · Sr.

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Section: Discussionmentioning

confidence: 99%

8.2 mJ, 324 MW, 5 kHz picosecond MOPA system based on Nd:YAG slab amplifiers

Chen

Liu

Yang

et al. 2016

J. Opt.

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Tunable deep ultraviolet laser based near ambient pressure photoemission electron microscope for surface imaging in the millibar regime

Ning

Wang

et al. 2020

Review of Scientific Instruments

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A newly developed instrument comprising a near ambient pressure (NAP) photoemission electron microscope (PEEM) and a tunable deep ultraviolet (DUV) laser source is described. This NAP-PEEM instrument enables dynamic imaging of solid surfaces in gases at pressures up to 1 mbar. A diode laser (976 nm) can illuminate a sample from the backside for in situ heating in gases up to 1200 K in minutes. The DUV laser with a tunable wavelength between 175 nm and 210 nm is perpendicularly incident onto the sample surface for PEEM imaging of a wide spectrum of solids with different surface work functions. Using this setup, we have first demonstrated spatiotemporal oscillation patterns of CO oxidation reaction on Pt(110) from high vacuum to NAPs and gas-induced restructuring of metal nanostructures in millibar gases. The new facility promises important applications in heterogeneous catalysis, electrochemical devices, and other surface processes under nearly working conditions.

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