“…This kind of processing imposes limitations on the final film properties, including conductivity and conformality of the coating [11]. In addition, other methods such as hydrothermal processes, chemical vapour deposition (CVD), physical sputtering, and molecular beam epitaxy (MBE) are widely used to develop nanostructured materials of different shapes [6,[12][13][14][15][16][17][18][19][20][21][22][23][24]. Although the capability of these methods to produce high-quality films and diverse compositions has been proven, they suffer from pressure or vacuum requirements, temperature constraints, the need for suitable substrates, and prolonged processing time, usually in the range of 4-12 hours [6,7,11,[25][26][27][28].…”