1999
DOI: 10.1016/s0925-4005(99)00018-0
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A study of sensing properties of Pt- and Au-loaded In2O3 ceramics

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Cited by 61 publications
(33 citation statements)
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“…For example, for In 2 O 3 :Ga-based sensors during H 2 detection the doping was accompanied by the power change from 130 mW to 180 mW, while for In 2 O 3 :P sensors the power dissipated in the maximum of sensor response has been changing from 130 mW to 260 mW. The same effect was also observed in [11] for In 2 O 3 :Ga-based sensors during detection of CH 4 . An increase of Ga-oxide concentration was being accompanied by the shift of the maximum sensitivity to methane from 400 1C (0% Ga 2 O 3 ) to 520 1C (20% Ga 2 O 3 ).…”
Section: Resultsmentioning
confidence: 65%
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“…For example, for In 2 O 3 :Ga-based sensors during H 2 detection the doping was accompanied by the power change from 130 mW to 180 mW, while for In 2 O 3 :P sensors the power dissipated in the maximum of sensor response has been changing from 130 mW to 260 mW. The same effect was also observed in [11] for In 2 O 3 :Ga-based sensors during detection of CH 4 . An increase of Ga-oxide concentration was being accompanied by the shift of the maximum sensitivity to methane from 400 1C (0% Ga 2 O 3 ) to 520 1C (20% Ga 2 O 3 ).…”
Section: Resultsmentioning
confidence: 65%
“…Features of oneelectrode gas sensors are discussed in details in [3]. At the present, metal oxides such as SnO 2 , In 2 O 3 , WO 3 and ZnO were tested for the one-electrode gas sensors design [4]. However, experiment has shown that In 2 O 3 , due to specific electrophysical properties, is the most promising material for such application [3][4][5].…”
Section: Introductionmentioning
confidence: 99%
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“…Doped with Pt 4+ or Au 3+ it becomes NH 3 sensitive. 4,5 In most applications the production of thin ITO films is necessary. For this purpose common methods of layer deposition such as evaporation of In 2 O 3 and SnO 2 powders [6][7][8][9][10][11][12] and ͑magnetron͒ dc-and rf-sputtering 2,[13][14][15][16][17][18][19] spray pyrolysis 1,5,20 are widely used.…”
Section: Introductionmentioning
confidence: 99%
“…45 Application-oriented works repeatedly reported the occurrence of metallic indium in different ITO layers. 4,10,[46][47][48] This formation is usually driven by strongly reducing conditions such as plasma-enhanced chemical-vapor deposition ͑PECVD͒, 39,49 ultrahigh vacuum ͑UHV͒, 5,12 and hydrogen gas 38 or acids in wet chemistry. 40,41 But also the neutrondiffraction study of González et al mentioned the occurrence of metallic indium after a reduction with the forming gas.…”
Section: Introductionmentioning
confidence: 99%