1994
DOI: 10.1557/proc-343-119
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A Study of the Surface Texture of Polycrystalline Phosphor Films Using Atomic Force Microscopy

Abstract: Stimulable phosphor thin films are being investigated for use as optical data storage media. We have successfully applied atomic force microscopy (AFM) to the measurement of the surface texture of these films. Determination of the surface texture of the films is important for evaluating the effect of surface quality on optical scatter. In other thin film material systems it has been found that the surface “bumps” revealed by AFM correspond to grains in the film. This is not the case for the stimulable phosphor… Show more

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Cited by 5 publications
(3 citation statements)
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“…(Dimensions in nanometers are supplied in the figure for greater concreteness. The scale is set by the actual granular surface [ 29 ] upon which the simulation was based.) The fidelity of the result is typical of cases in which the specimen contains features somewhat sharper than the tip.…”
Section: Blind Estimation Of Tip Shapementioning
confidence: 99%
See 1 more Smart Citation
“…(Dimensions in nanometers are supplied in the figure for greater concreteness. The scale is set by the actual granular surface [ 29 ] upon which the simulation was based.) The fidelity of the result is typical of cases in which the specimen contains features somewhat sharper than the tip.…”
Section: Blind Estimation Of Tip Shapementioning
confidence: 99%
“… Illustration of results of blind tip reconstruction. A 2 µm × 2 µm simulated surface (a 1 µm × 1 µm piece of which is shown at top), similar to an experimentally observed granular surface [ 29 ], was constructed with minimum feature radius 25 nm. An image was computed by dilation with the actual tip (shown), constructed with 40 nm radius at the apex.…”
Section: Figmentioning
confidence: 99%
“…5 " 7 Stimulable photoluminescent thin films are being investigated for use as erasable information storage media. 8 ' 9 Materials of interest include SrS and BaF 2 . Determination of thickness is important for thin film process development.…”
Section: Introductionmentioning
confidence: 99%