A UV curable resin with reworkable properties: application to imprint lithography

Matsukawa, Daisaku; Wakayama, Hiroshi; Mitsukura, Kazuyuki; Okamura, Hitoshi; Hirai, Yoshihiko; Shirai, Masamitsu

doi:10.1039/b905188k

Cited by 17 publications

(15 citation statements)

References 24 publications

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“…Based on this point of view, we have developed a series of "reworkable" epoxy resins having tertiary ester linkages [5][6][7][8][9][10][11], sulfonate ester linkages [12], and hemiacetal ester linkages [13] as thermallycleavable units. The reactivity, sensitivity, thermal or chemical stability, and re-dissolution property of the polymers must be improved in terms of their practical use.…”

Section: Introductionmentioning

confidence: 99%

“…Reworkable resins [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15], which are thermosets thermally or chemically degradable under a given condition, have been extensively studied as environmentally-friendly materials without damaging the underlying materials. Based on this point of view, we have developed a series of "reworkable" epoxy resins having tertiary ester linkages [5][6][7][8][9][10][11], sulfonate ester linkages [12], and hemiacetal ester linkages [13] as thermallycleavable units.…”

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Photo-degradation of Reworkable Resin: A Mechanical Study

Okamura

Nomura

Matsumoto

2017

J. Photopol. Sci. Technol.

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A mechanical investigation of reworkable resins was carried out using a reworkable monomer as an adhesive. A methacrylate monomer which has both an epoxy moiety and a thermally cleavable tertiary ester moiety in a molecule was employed as the reworkable monomer. The lap shear adhesion strength of the cured reworkable monomer decreased after decomposition by photo-irradiation followed by baking. The decrease revealed by FT-IR measurements was due to the acid-catalyzed decomposition of the tertiary ester linkages in the cured reworkable monomer.

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Photo-degradation of Reworkable Resin: A Mechanical Study

Okamura

Nomura

Matsumoto

2017

J. Photopol. Sci. Technol.

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“…Recently, to eliminate this problem, it was proposed to use a replicated resin mold of the original quartz mold (Fig. 1) [13]. The resin mold is inexpensive and is disposed when contaminated.…”

Section: Resultsmentioning

confidence: 99%

“…1) [13], the replicated resin mold was made up by a mixture of PTA, DEGMM, and PAG or PBG monomers. DMPA was added as a photoradical initiator.…”

Section: Fig 2 Uv Imprint Processmentioning

confidence: 99%

Photoacid- and Photobase-Generating Monomers for Surface Modification of Cured Resin: Application to Novel Resin Mold for UV Imprint

Horii

Yamane

Okamura

et al. 2012

J. Photopol. Sci. Technol.

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Several types of photoacid-and photobase-generating monomers were prepared. These monomers were cured with multi-functional acrylate monomers by irradiation at 365 nm. The surface of the cured resin was exposed to 254nm light to generate hydrophilic surface. Water contact angles of the resin surface having acid units (-SO 3 H or -COOH) and amine units (-NH 2 ) were 25~36 o and 38~43 o , respectively, depending on the resin composition. A mold for UV imprint lithography (UV-IL) was prepared using the cured resin with hydrophilic surface. It was shown that the resin mold could be used for UV-IL without surface treatment using demolding agents.

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“…We have previously reported the photocurable resins which can be re-dissolved in solvents by thermal treatments [5][6][7]. We have also reported the application of the reworkable resins as functional materials for nanoimprint lithography [8,9].…”

Section: Introductionmentioning

confidence: 99%