Advance TEM application in 10 nm and below technology node chips

Abstract

In 10nm and below technology node, the device changes smaller and introduced some new process changes, some advance TEM methods are used in the 10nm and below device process monitor or research tools during the process developing. We did some advance TEM research on Fin and metal gate, and some examples are given in this paper. It is clearly show the importance of advance TEM method play essential role in process monitor and process developing.