Aerial image measurement methods for fast aberration set-up and illumination pupil verification

Laan, Hans van der; Dierichs, Marcel; Greevenbroek, Henk van; McCoo, Elaine; Stoffels, Fred; Pongers, Richard; Willekers, Rob

doi:10.1117/12.435757

Cited by 42 publications

(27 citation statements)

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“…Published by sensor (TIS) at multiple illumination settings) [6,7], and Nikon's Z37 AIS (Aerial Image Sensor) [8,9], aberration ring test [10,11] and phase wheel method [12].…”

Section: Osamentioning

confidence: 99%

Even aberration measurement of lithographic projection optics based on intensity difference of adjacent peaks in alternating phase-shifting mask image

et al. 2010

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This paper proposes an in-situ technique for measuring even aberration of lithographic projection optics. By using Hopkins theory of partial coherent imaging and thick-mask model, the linear relationship between intensity difference of adjacent peaks in alternating phase shifting mask (Alt-PSM) image and even aberration is established by equations and verified by numerical results. The sensitivity of measuring even aberration of lithographic projection optics based on this linear relationship is analyzed, and the measurement mark is designed accordingly. The measurement performance of the present technique is evaluated using lithographic OSA Published bysimulator PROLITH, which shows the present technique is capable of measuring even aberration of lithographic projection optics with ultrahigh measurement accuracy.

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“…Published by sensor (TIS) at multiple illumination settings) [6,7], and Nikon's Z37 AIS (Aerial Image Sensor) [8,9], aberration ring test [10,11] and phase wheel method [12].…”

Section: Osamentioning

confidence: 99%

Even aberration measurement of lithographic projection optics based on intensity difference of adjacent peaks in alternating phase-shifting mask image

et al. 2010

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“…TIS is used to monitor and update system drift during use in production. This is achieved without any test exposures on wafers and manual interpretation of machine operators [1,11].…”

Section: Introductionmentioning

confidence: 99%

“…The Tis at multiple illumination settings (TAMIS) technique has been developed to measure wavefront aberration and balances well between the performance and the cost [11]. In this technique, the aerial image of a binary mark is directly measured to determine the coma aberration.…”

Section: Introductionmentioning

confidence: 99%

Coma measurement by use of an alternating phase-shifting mask mark with a specific phase width

et al. 2009

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The correlation between the coma sensitivity of the alternating phase-shifting mask (Alt-PSM) mark and the mark's structure is studied based on the Hopkins theory of partially coherent imaging and positive resist optical lithography (PROLITH) simulation. It is found that an optimized Alt-PSM mark with its phase width being two-thirds its pitch has a higher sensitivity to coma than Alt-PSM marks with the same pitch and the different phase widths. The pitch of the Alt-PSM mark is also optimized by PROLITH simulation, and the structure of p ¼ 1:92λ=NA and pw ¼ 2p=3 proves to be with the highest sensitivity. The optimized Alt-PSM mark is used as a measurement mark to retrieve coma aberration from the projection optics in lithographic tools. In comparison with an ordinary Alt-PSM mark with its phase width being a half its pitch, the measurement accuracies of Z 7 and Z 14 apparently increase.

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“…In-situ measurement of wavefront aberration has been a critical subject for more than 10 years, and several techniques have been reported to characterize projection lens aberrations. [6][7][8] One of the recent examples, Z37 AIS, an aerial image-based technique proposed by Hagiwara, 9 Tyminski, 10 and later extended by Liu,11 uses 36 gratings with 6 orientations to measure Zernike aberration up to Z 37 , and the gratings have six pitches for each orientation.…”

Section: Introductionmentioning

confidence: 99%

Practical application of aerial image by principal component analysis to measure wavefront aberration of lithographic lens

Duan

Wang

Yan

et al. 2012

J. Micro/Nanolith. MEMS MOEMS

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Abstract. In this paper, we propose a new method that can extract aberrations using aerial image measurements and present its experimental results on lithographic tools. Based on physical simulation and statistical analysis, a linear regression matrix is obtained establishing a connection between principal component coefficients of specific aerial images and Zernike coefficients. In the application phase, the aberrations of the projection lens are solved via the use of this regression matrix. An engineering model is established based on an extension of theoretical model that incorporates all the significant systematic errors. The performance of the engineering model as applied on a 0.75 NA ArF scanner is reported. In the experiment, measurement marks oriented in orthogonal directions are used and aerial images at 9 field points are measured. To verify the repeatability of this technique, every point is measured 20 times. By inputting the aerial images into the engineering model, Zernike coefficients are solved and the results are analyzed. The wafer exposures were performed to evaluate the results of aberration correction.

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Aerial image measurement methods for fast aberration set-up and illumination pupil verification

Cited by 42 publications

References 0 publications

Even aberration measurement of lithographic projection optics based on intensity difference of adjacent peaks in alternating phase-shifting mask image

Even aberration measurement of lithographic projection optics based on intensity difference of adjacent peaks in alternating phase-shifting mask image

Coma measurement by use of an alternating phase-shifting mask mark with a specific phase width

Practical application of aerial image by principal component analysis to measure wavefront aberration of lithographic lens

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