Amine-functionalized fumed silica for CO2 capture through particle molecular layer deposition

Lai, Annika; Loehde-Woolard, Hailey C.; McNeary, W. Wilson; Burger, Jessica; Pfeffer, Robert; Weimer, Alan W.

doi:10.1016/j.ces.2021.116954

Cited by 5 publications

(4 citation statements)

References 27 publications

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“…Lai and co-workers prepared two different amine functionalized SiO 2 by depositing (3-aminopropyl) triethoxysilane (APTES) and N1-(3-trimethoxysilylpropyl) diethylenetriamine (TMPTA) precursors using MLD on fumed SiO 2 . 540 Both precursors were individually deposited at 150 1C in a binary reaction with water (Fig. 40(a)-(c)).…”

Section: Co 2 Capture/separationmentioning

confidence: 99%

Atomic/molecular layer deposition strategies for enhanced CO₂ capture, utilisation and storage materials

Olowoyo,

Gharahshiran,

Zeng

et al. 2024

Chem. Soc. Rev.

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Section: Co 2 Capture/separationmentioning

confidence: 99%

Atomic/molecular layer deposition strategies for enhanced CO₂ capture, utilisation and storage materials

Olowoyo,

Gharahshiran,

Zeng

et al. 2024

Chem. Soc. Rev.

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“…New organic components have also been developed for the purely organic MLD processes; the MLD material library already includes, besides the initially introduced polyimides [ 15,17–22,137–143 ] and polyamides, [ 15,23–28,144–149 ] many other polymers: polyurea, [ 29,30,37,38,51,150–164 ] polythiourea, [ 52 ] polyurethane, [ 165,166 ] polyazomethine, [ 167–172 ] poly(3,4‐ethylenedioxy‐thiophene), [ 173–177 ] polyimide–polyamide, [ 141 ] poly(ethylene terephthalate) (PET), [ 50,178–180 ] and others. [ 31,32,39–44,176,181–200 ] In recent years, the organic precursor library has been rapidly expanding. We have collected in Table 1 the organic precursors so far used in ALD/MLD processes, together with the heating temperatures employed for their evaporation in the corresponding process conditions; [ …”

Section: Organic Precursors In Ald/mldmentioning

confidence: 99%

Atomic/Molecular Layer Deposition for Designer's Functional Metal–Organic Materials

Multia

Karppinen

2022

Adv Materials Inter

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organic ligands act as bridges between the metal centers to form infinite 1D, 2D, or 3D structures. These materials are often referred to as coordination polymer (CP) [1] or metal-organic framework (MOF) [2] materials; the latter term is used when the metal-organic material is crystalline and highly porous. [3] The research field of CP-and MOF-type materials has grown tremendously over the last two decades. The structural and chemical diversity of these materials has served as a continuous source of scientific excitement; the same diversity has also triggered huge technological interest as these materials possess enormous potential to be tailored for a wide variety of applications ranging from gas capture, storage, and separation to sensing, catalysis, optics, electronics, and energy storage. [4][5][6][7] Most of the targeted application breakthroughs of metal-organics require that these materials can be produced as highquality thin films and coatings, which can be integrated with the other components in the actual device configuration. The possibility to deposit such thin films in an industry-feasible manner on the substrate types needed, would be a major step forward in the field. [8] Traditionally, solvent-based processes such as liquid-phase epitaxy, Langmuir-Blodgett, layer-by-layer, and electrochemical deposition techniques have been used for metal-organic thin films. [9][10][11] These are, however, incompatible with the requirements set by the possible integration of the materials in microelectronics. This is due to corrosion and contamination risks, and the problems in patterning and precise deposition on high-aspect-ratio features. Hence, it is vital to develop solventfree thin-film deposition routes for the metal-organic material family. In the optimal case, these deposition methods should allow conformal coatings on large-area and high-aspect-ratio substrates.The currently strongly emerging ALD/MLD technique is uniquely suited to address the challenge in a scientifically elegant yet industrially feasible way. This technique is derived from the two parent gas-phase thin-film techniques: ALD for inorganic materials (mostly binary metal oxides, sulfides, and nitrides), [12][13][14] and its counterpart MLD for purely organic thin films (e.g., polyimides and polyamides). [15] In both cases, the attractive film growth characteristics are derived from the unique way of separating the different precursor gas pulses. Currently, ALD is the standard thin-film technology in many Atomic layer deposition (ALD) for high-quality conformal inorganic thin films is one of the cornerstones of modern microelectronics, while molecular layer deposition (MLD) is its less-exploited counterpart for purely organic thin films. Currently, the hybrid of these two techniques, i.e., ALD/MLD, is strongly emerging as a state-of-the-art gas-phase route for designer's metal-organic thin films, e.g., for the next-generation energy technologies. The ALD/MLD literature comprises nearly 300 original journal papers covering most of the alkali...

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“…Presently, the materials used for CO 2 capture mainly include alcohol amine solution, porous solid materials, and separation membrane [3]. The porous solid materials, such as metal organic frameworks (MOFs) [4], activated carbons [5,6], carbon gels [7,8], carbon fibers [9], aminefunctionalized fumed silica [10], zeolites [11], and porous polymers [12], are one of the most popular CO 2 capture materials due to their high adsorption capacity, easy regeneration, ease of operation, cost-effectiveness, durability, etc. [2,3,13].…”

Section: Introductionmentioning

confidence: 99%

Controlled preparation of nitrogen-doped hierarchical carbon cryogels derived from Phenolic-Based resin and their CO2 adsorption properties

Zhou

Luo

Yan

et al. 2022

Energy

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Amine-functionalized fumed silica for CO2 capture through particle molecular layer deposition

Cited by 5 publications

References 27 publications

Atomic/molecular layer deposition strategies for enhanced CO₂ capture, utilisation and storage materials

Atomic/molecular layer deposition strategies for enhanced CO₂ capture, utilisation and storage materials

Atomic/Molecular Layer Deposition for Designer's Functional Metal–Organic Materials

Controlled preparation of nitrogen-doped hierarchical carbon cryogels derived from Phenolic-Based resin and their CO2 adsorption properties

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Amine-functionalized fumed silica for CO2 capture through particle molecular layer deposition

Cited by 5 publications

References 27 publications

Atomic/molecular layer deposition strategies for enhanced CO2 capture, utilisation and storage materials

Atomic/molecular layer deposition strategies for enhanced CO2 capture, utilisation and storage materials

Atomic/Molecular Layer Deposition for Designer's Functional Metal–Organic Materials

Controlled preparation of nitrogen-doped hierarchical carbon cryogels derived from Phenolic-Based resin and their CO2 adsorption properties

Contact Info

Product

Resources

About

Atomic/molecular layer deposition strategies for enhanced CO₂ capture, utilisation and storage materials

Atomic/molecular layer deposition strategies for enhanced CO₂ capture, utilisation and storage materials