“…Controlled self-assembly of (co)polymers and related compounds is a key technology to construct ordered nanostructures and nanopatterns in functional materials, thin films, and devices for various applications (e.g., bioapplications, membranes, electronic devises, and lithography). − Among them, controlling sub-10 nm scale structures is often required to realize targeted properties and performance, while easy access to such small nanostructures is still challenging in self-assembly of polymers. For this purpose, two types of strategies have typically been examined: One is self-assembly of high-χ low- N block copolymers comprising short and incompatible chains (χ, Flory–Huggins interaction parameter; N , the total degree of polymerization) − and the other is that of (co)polymers bearing short and incompatible side chains, including brush, graft, random, copolymers, and homopolymers. − The former method involves well-controlled block copolymers with narrow molecular weight distribution, because N and molecular weight distribution directly affect the domain spacing and the uniformness . However, the latter possibly affords the control of the domain size and structures by the side chain length and composition, and thus, N and molecular weight distribution may not affect the domain spacing.…”