Abstract:The metallization of porous silicon (PSi) is generally realized through physical vapor deposition (PVD) or electrochemical processes using aqueous solutions. The former uses a strong vacuum and does not allow for a conformal deposition into the pores. In the latter, the water used as solvent causes oxidation of the silicon during the reduction of the salt precursors. Moreover, as PSi is hydrophobic, the metal penetration into the pores is restricted to the near-surface region. Using a solution of organometalli… Show more
Mixed MnO–Cu nanoparticles are synthesised in an ionic liquid, and the suspensions are spread and annealed directly on technological substrates to form films suitable for the metallisation of through-Si vias.
Mixed MnO–Cu nanoparticles are synthesised in an ionic liquid, and the suspensions are spread and annealed directly on technological substrates to form films suitable for the metallisation of through-Si vias.
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