An investigation of structure, magnetic properties and magnetoresistance of Ni films prepared by sputtering

Magnetic Properties of Evaporated Ni Thin Films: Effect of Substrates, Thickness, and Cu Underlayer

“…For the same system, Ni/Al 2 O 3 , but prepared by the electrodeposition method, Shi et al [12] reported H C values of 97 and 404 Oe for a 60 and 30-nm-thick samples respectively; these coercive fields are still higher than the ones we observed. As for the Ni/glass, Yi et al [13] noted H C values equal to 700 Oe for a 50-nm-thick magnetronsputtered Ni, this value is quite larger than the one we measured for a comparable thickness (around 50 Oe). Also Nacereddine et al [14] reported H C values for evaporated Ni/glass between 30 and 146 Oe for Ni thicknesses ranging from 31 to 165 nm.…”

“…Yu et al [7] made a comparison between the Ni characteristics deposited on SiO 2 /Si(100) by oblique angle sputtering and conventional sputtering. The structure and magnetic properties were also investigated for DC magnetron-sputtered Ni films onto glass substrate, [8] the authors showed that the 15-nm-thick film presents a large amount of amorphous structure which they believe is responsible for the decrease of the magnetoresistance in this thin sample.…”

“…In Figure 5, we show examples of hysteresis curves for Ni/Cu/glass with four different thicknesses (4,8,14, and 67 nm) (Figure 5a) and for Ni/Cu with different substrates (Si, Cu, Al 2 O 3 , and mica) and a fixed Ni thickness, t = 67 nm, (Figure 5b). In Figure 5(a), one can see clearly the effect of thickness on the shape of the hystersis curves; the one corresponding to t = 14 nm is much square shaped than the other two.…”

Properties of nickel films growth by radio frequency magnetron sputtering at elevated substrate temperatures

“…Furthermore, it was demonstrated that magnetron sputtering techniques i.e., direct-current (DC) magnetron sputtering and radio frequency (RF) magnetron sputtering could control over the sputtering conditions [8][9][10][11][12][13] and produce very high purity films owing to their clean environmentally friendly closed systems [14]. For instances, Yi et al [15] and Priyadarshini et al [16] reported on the structural, magnetic, and magnetoresistance properties, and morphology of Ni films deposited using DC magnetron sputtering. In contrast, the application of RF magnetron deposition for fabricating Ni films with different substrate temperatures is unexplored.…”

Structural and Magnetic Properties of Fe Films Electrodeposited on Al Substrates

“…The coercive field value is affected by the defects, grain size, grain boundaries, impurities, surface, and interfacial state. High coercive field may be attributed to voids and oxidation in the grain boundaries, [27] to disordered structure and crystalline defects [28] and to the high density of dislocation. [29] There is, in fact, no unique model which can take into account all these factors.…”