The rapid increase in worldwide power consumption has inspired intensive research on photovoltaic cells as a renewable energy source. During recent years, III-V multiple junction solar cells (MJSCs) have been the focus of research attention because of their high conversion efficiency, for which a record of 46% has been achieved by 4-junction structure under a concentration light of 508 sun [1]. At present, the cost of III-V semiconductor solar cells is still relatively high as compared to that of silicon solar cells, and limits their usages to some special tasks, including concentrating photovoltaic (CPV) [2, 3] and space applications [4,5]. Much effort has been devoted recently to reduce the cost of GaAs based solar cells including the epitaxy cost, generally by metalorganic vapor phase epitaxy (MOVPE). This can be achieved by either increasing the GR (decrease machine overhead time) or improving material (source) utilization [6][7][8]. From price per watt analysis, the reduction in the overhead time of MOVPE reactors, together with the improvement in material utilization efficiency, can reduce the cost of GaAs single junction solar cells by 74%, when the GR of GaAs is boosted from 14 to 56 µm h −1 with performance loss less than 1% [7,8]. Recently, GaAs n-on-p solar cells grown at a speed of 100 µm h −1 have been recently reported with a high conversion efficiency of 23.6% under AM1.5G condition [9]. They also demonstrated that the GR of GaAs could reach 140 µm h −1 with more than 50% of Ga source utilization. Our research group has previously demonstrated that the GR of GaAs in our MOVPE system could be enhanced to 90 µm h −1 [10, 11], by shrinking the boundary layer thickness for the mass transport of a Ga precursor [12]. In addition, GaAs p-on-n solar cells exhibited insignificant degradation of cell efficiency which their n-base layers were deposited at 80 µm h −1 using a V/III ratio of 40 as compared to the growth at 20 and 60 µm h −1 [10]. A high V/III ratio can plausibly be a reason for no degradation in the cell performance up to 80 µm h −1 . In addition, several reports have shown that the hole lifetime is less sensitive to the increase in the threading dislocation density in GaAs than the electron lifetime [13,14]. This may make a p-on-n device more robust against an increase