Analysis of Post Cleaning Solution After Wet Cleaning of Shadow Mask Used in OLED Process

Abstract

Abstract:The post cleaning method for clean the shadow mask using in OLED (organic light emitting diode) emitter layer is always reforming. The cleaning solution and analysis method of shadow mask is still lack and not optimized. We use the simple and useful analytical method to determine the quantity and quality of organic and inorganic residue on surface of shadow mask. Finally analyze the cleaning solution using Raman spectroscopy efficiently. OLED증착시 사용되는 발광물질로는 DCJTB(4-(dicyanomethylene)-2-t-butyl-6-(1,1,7,7-tetramethyljulolidyl-9-enyl)-4H-pyran), 6) Alq 3 , 7) DSB(1,4-distyrylbenzene) deriva-