14th Pacific Rim Conference on Lasers and Electro-Optics (CLEO PR 2020) 2020
DOI: 10.1364/cleopr.2020.p4_12
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Analysis of wavefront aberration in a single collimating lens based dual-beam exposure system

Abstract: We analyzed the interference wavefront aberration in a single collimating lens based dual-beam exposure system. A linear relationship between the aberration and pinholes’ position was obtained and a 0.03λ-aberration in 65mm×65mm area was achieved.

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