Angle resolved photoelectron spectroscopy as applied to X-ray mirrors: an in depth study of Mo/Si multilayer systems

Sakhonenkov, Sergei S.; Filatova, E. O.; Gaisin, Aidar U.; Kasatikov, Sergey A.; Konashuk, Aleksei S.; Плешков, Р. С.; Чхало, Н. И.

doi:10.1039/c9cp04582a

Cited by 31 publications

(20 citation statements)

References 35 publications

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“…Five different take-off angles (TOA) of photoelectron (i.e., 30°, 45°, 60° and 90°) were adjusted using tilted-specimen holders for the depth profiling AR-XPS analysis, as discussed elsewhere (Sakhonenkov et al, 2019). The symbols of oxidized ( ox ) and metallic (°) species which come from the passive layers and underlying alloy surface of the W-xNb deposits are used hereafter.…”

Section: Methodsmentioning

confidence: 99%

Study on the synergism of corrosion-resistant W-xNb alloys by angle-resolved X-ray photoelectron spectroscopy

Bhattarai

2021

Ceylon J. Sci.

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The synergistic effect of simultaneous addition of tungsten and niobium to the sputter-deposited binary alloys of W-xNb (x = 26, 78) on exhibiting a very high corrosion-resistant activity in 12 M hydrochloric acid was studied using depth profiling technique of an angle-resolved X-ray photoelectron spectroscopy (AR-XPS) at 30 ℃. Both binary W-26Nb and W-78Nb alloys exhibited higher corrosion resistance properties compared with those of alloying metals, tungsten and niobium. The average corrosion rate (0.0054 -0.0101 mm/y) noticed was nearly ten times less compared with that of W and Nb metals. Results of the depth profiling analyses of these corrosionresistant W-xNb alloys by AR-XPS technique revealed that such corrosion action of the alloys is largely owing to the occurrence of homogeneous passive layers with W ox and Nb 5+ ions without in-depth concentration variations after immersion in 12 M hydrochloric acid, open to air, at 30 ℃. As a consequence, W and Nb metals acted synergistically in increasing the spontaneous passivity and the high corrosion resistance of the W-xNb deposits in 12 M hydrochloric acid.

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Section: Methodsmentioning

confidence: 99%

Study on the synergism of corrosion-resistant W-xNb alloys by angle-resolved X-ray photoelectron spectroscopy

Bhattarai

2021

Ceylon J. Sci.

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“…The selection is based on the optical properties of materials in the given wavelengths range. For example, Mo/Si PMMs are primarily used for the wavelength of 13.5 nm (EUV), and Mo/B and La/B PMMs are excellent for 6.7 nm (BEUV) because boron has lower absorption in this range compared to silicon [20][21][22][23][24]. Co/C PMMs are the most effective for the shorter wavelength range of 4.4-4.5 nm [25].…”

Section: Materials and Designmentioning

confidence: 99%

Multilayer Reflective Coatings for BEUV Lithography: A Review

Uzoma

Salman

et al. 2021

Nanomaterials

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The development of microelectronics is always driven by reducing transistor size and increasing integration, from the initial micron-scale to the current few nanometers. The photolithography technique for manufacturing the transistor needs to reduce the wavelength of the optical wave, from ultraviolet to the extreme ultraviolet radiation. One approach toward decreasing the working wavelength is using lithography based on beyond extreme ultraviolet radiation (BEUV) with a wavelength around 7 nm. The BEUV lithography relies on advanced reflective optics such as periodic multilayer film X-ray mirrors (PMMs). PMMs are artificial Bragg crystals having alternate layers of “light” and “heavy” materials. The periodicity of such a structure is relatively half of the working wavelength. Because a BEUV lithographical system contains at least 10 mirrors, the optics’ reflectivity becomes a crucial point. The increasing of a single mirror’s reflectivity by 10% will increase the system’s overall throughput six-fold. In this work, the properties and development status of PMMs, particularly for BEUV lithography, were reviewed to gain a better understanding of their advantages and limitations. Emphasis was given to materials, design concepts, structure, deposition method, and optical characteristics of these coatings.

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“…The selection is based on the optical properties of materials in the given wavelengths range. For example, Mo/Si PMMs are primarily used for the wavelength of 13.5 nm (EUV), Mo/B and La/B PMMs are excellent for 6.7 nm (BEUV) since Boron has lower absorption in this range compared to silicon [20][21][22][23][24]. Co/C PMMs are the most effective for the shorter wavelength range of 4.4 -4.5 nm [25].…”

Section: Materials and Designmentioning

confidence: 99%

Multilayer Reflective Coatings for BEUV Lithography: A Review

Uzhoma¹,

Shabir²,

Hu³

et al. 2021

Preprint

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The development of microelectronics is always driven by reducing transistor size and increasing integration, from the initial micron-scale to the current few nanometers. The photolithography technique for manufacturing the transistor needs to reduce the wavelength of the optical wave, from ultraviolet, deep, to the existing extreme ultraviolet light. One approach toward decreasing the working wavelength is using lithography based on beyond extreme ultraviolet radiation (BEUV) with a wavelength around 7 nm. The BEUV lithography relies on advanced reflective optics such as periodic multilayer film X-ray mirrors (PMMs). PMMs are artificial Bragg crystals having alternate layers of “light” and “heavy” materials. The periodicity of such a structure is relatively half of the working wavelength. Since a BEUV lithographical system contains at least 10 mirrors, optics’ reflectivity becomes a crucial point. The increasing of a single mirror's reflectivity by 10% will increase the system’s overall throughput by 6 times. In this work, the properties and development status of PMMs, particularly for BEUV lithography, were reviewed to gain a better understanding of their advantages and limitations. Emphasis was given to materials, design concepts, structure, deposition method, and optical characteristics of these coatings.

show abstract

Angle resolved photoelectron spectroscopy as applied to X-ray mirrors: an in depth study of Mo/Si multilayer systems

Abstract: The chemical composition and extension of interfaces of a multilayer mirror were investigated by means of ARXPS relying on the concept of the EAL.

Cited by 31 publications

References 35 publications

Study on the synergism of corrosion-resistant W-xNb alloys by angle-resolved X-ray photoelectron spectroscopy

Study on the synergism of corrosion-resistant W-xNb alloys by angle-resolved X-ray photoelectron spectroscopy

Multilayer Reflective Coatings for BEUV Lithography: A Review

Multilayer Reflective Coatings for BEUV Lithography: A Review

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