2005
DOI: 10.4028/www.scientific.net/msf.475-479.3923
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Annealing Effects on the Structural Properties of Gold Films on Si by the RF Magnetron Sputtering

Abstract: We have investigated the effect of annealing temperature on the structural property of Au thin films deposited on Si(100) substrate using the radio frequency (RF) magnetron sputtering technique. X-ray diffraction revealed that the relative intensities and FWHM of (111), (200), and (311) peaks increased and decreased, respectively, after thermal annealing at 600°C. Scanning electron microscopy indicated that after annealing at 600-700°C, Au structures agglomerated on Si(100) surfaces. Energy dispersive x-ray sp… Show more

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Cited by 6 publications
(2 citation statements)
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“…For example, Lee K. et al reported severe hillock formation and structures decrease in sputtered gold thin films on Si substrate after annealing at 600 and 700 °C. [ 64 ]…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…For example, Lee K. et al reported severe hillock formation and structures decrease in sputtered gold thin films on Si substrate after annealing at 600 and 700 °C. [ 64 ]…”
Section: Resultsmentioning
confidence: 99%
“…For example, Lee K. et al reported severe hillock formation and structures decrease in sputtered gold thin films on Si substrate after annealing at 600 and 700 °C. [64] To further explore the impact of hillock formation on reliability and electrical behavior, future experiments such as long-term thermal cycling and thermal shocking will be conducted, and more complex device structures such as metal-insulator-metal capacitor where the gold is not on the surface will be fabricated and tested, and the results will be discussed in a forthcoming publication.…”
Section: Hillocksmentioning
confidence: 99%