2016
DOI: 10.1557/jmr.2016.275
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Antibacterial metal ion release from diamond-like carbon modified surfaces for novel multifunctional implant materials

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Cited by 15 publications
(13 citation statements)
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References 30 publications
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“…Doubling the fluence to 2 · 10 17 cm −2 or reducing it by a factor of two to 5 · 10 16 cm −2 leads to an increased ratio of 1.98, and 2.18, respectively. The shift of the G-Peak shows the same trend with the lowest wave number of 1554 cm −1 for the fluence that was shown to be optimal for this process 21 and higher wavenumbers of 1562 cm −1 and 1559 cm −1 for the halved and the doubled fluence. Both parameters are indicators for the sp 3 fraction 22 .…”
Section: Resultssupporting
confidence: 52%
See 1 more Smart Citation
“…Doubling the fluence to 2 · 10 17 cm −2 or reducing it by a factor of two to 5 · 10 16 cm −2 leads to an increased ratio of 1.98, and 2.18, respectively. The shift of the G-Peak shows the same trend with the lowest wave number of 1554 cm −1 for the fluence that was shown to be optimal for this process 21 and higher wavenumbers of 1562 cm −1 and 1559 cm −1 for the halved and the doubled fluence. Both parameters are indicators for the sp 3 fraction 22 .…”
Section: Resultssupporting
confidence: 52%
“…Employing a plasma immersion ion implantation process to colloidal poly(vinylpyrrolidone) (PVP) films containing ZnO NPs, we prepare DLC-coatings and characterize these samples as described earlier 21 . Subsequently, we incubate the samples in aqueous solutions and measure their ion release kinetics.…”
Section: Resultsmentioning
confidence: 99%
“…A quantitative correlation between local shear rates and time-dependent detachment of cells might give further insight into the shear sensitivity of arbitrary cell-substrate-combinations. Interesting systems thereby include novel metal ion releasing implant materials [53] and osteoblasts. On the other hand, cell biologists may apply the DANI-setup to study the internal response of adaptive processes of adherent cells to shear flow.…”
Section: Discussionmentioning
confidence: 99%
“…The hardness was measured on a nanoindenter (MTSXP, MTS, Minneapolis, MN, USA) under a load of 2 mN, in a continuous stiffness measurement test pattern. The intrinsic stress was calculated using the Stoney formula [15,16], and the thickness of the silicon substrate and the film was measured with a three-dimensional white-light profiler (ManoMap-D, AEP, Columbus, OH, USA).…”
Section: Mechanical Testmentioning
confidence: 99%