Poly-3-hexylthiophene (P3HT) is coated on a chemically modified SiO 2 gate dielectric layer as an active layer to fabricate organic thin-film transistors (OTFTs). This study uses a new atmosphericpressure plasma (APP) approach to treat SiO 2 surfaces, and investigates its effect on the electric characteristics of OTFTs. The APP process can be performed at low temperature (<100 ) and atmospheric pressure, so it is very suitable for use on a plastic substrate. After the SiO 2 surface has been modified by the APP process with hexamethyldisilazane (HMDS), it exhibits typical I-V characteristics of TFTs. Calculations reveal that its field effect mobility can reach 0.02-0.03 cm 2 /Vs, which is about 15 times higher than that before the modification, and the threshold voltage is below -10V. The performance is even better than that obtained following the usual surface treatment of the SiO 2 surface by spincoating or evaporation.There has been great interest in thin-film transistors made of organic compounds, since organic thin-film transistors (OTFTs) have many unique advantages, such as lightweight, flexibility, and low-cost fabrication (1-5). They have therefore attracted much interest over recent years. Its potential applications include active matrix flexible displays, electronic paper (e-paper), smart cards, radio-frequency identification devices and other consumer electronics. Most attention has been paid to the soluble conjugated polymer, because it can be rapidly coated on a substrate with a large surface area by spin coating (6-8). Since P3HT is apt to be synthesized and has high carrier mobility (9-11), it is the most frequently compound used in various polymer semiconductors. However, the performance of OTFTs depends strongly on the semiconductor/dielectric interface. When P3HT is coated on an SiO 2 dielectric layer, the difference between the physical and chemical properties of the organic and inorganic materials is such that a problem of incompatibility arises at their interface (12), not only leading to poor adhesion, but also influencing the structural ordering of the P3HT chain during film formation, making the performance of OTFT poor. Many approaches have been adopted to solve the interface problem, such as the use of self-assembled monolayers (SAMs) to treat SiO 2 surfaces (13)(14). SAMs are typically deposited by spin-coating or evaporation on a dielectric layer. They improve the electric properties of OTFTs after treatment.This work presents a new rapid organic APP surface treatment of an SiO 2 surface at room temperature. The APP process can generate high-density plasma in the absence of a vacuum system, and it can be used to treat the surface of various substrates at low temperature and in the ambient environment. Therefore, this study uses the APP process to deposit HMDS on the surface of SiO 2 , and analyzes the surface characteristics ECS Transactions, 11 (25) 43-49 (2008) 10.1149/1.2930792 © The Electrochemical Society 43 ) unless CC License in place (see abstract). ecsdl.org/site/terms_use add...