2013
DOI: 10.1002/pssb.201248573
|View full text |Cite
|
Sign up to set email alerts
|

Application of external tensile and compressive strain on a single layer InAs/GaAs quantum dot via epitaxial lift‐off

Abstract: Tensile and compressive strains via epitaxial lift-off (ELO) techniques were applied on single-layer InAs/GaAs quantum dots (QDs). At low temperatures, due to the difference in thermal expansion coefficients of the ELO film and host substrate, the ELO QDs film bonded to Si and MgO substrates experienced tensile and compressive strain, respectively. At 13 K, we observed that the photoluminescence (PL) spectra of the ELO film bonded to MgO blueshifts by 10 meV while the ELO film bonded to Si redshifts by 8.5 meV… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2015
2015
2024
2024

Publication Types

Select...
5

Relationship

0
5

Authors

Journals

citations
Cited by 6 publications
(1 citation statement)
references
References 21 publications
0
1
0
Order By: Relevance
“…The second term represents carrier trapping into the QDs, where possible state-filling of QD energy states is also considered. Photoluminescence spectroscopy conducted by Omambac et al shows three distinct peaks corresponding to the recombination in the ground state and the first-and second-excited states [30]. The QD carrier density saturation value n sat D is then given by…”
Section: Numerical Simulation Using Rate Equation Modelmentioning
confidence: 99%
“…The second term represents carrier trapping into the QDs, where possible state-filling of QD energy states is also considered. Photoluminescence spectroscopy conducted by Omambac et al shows three distinct peaks corresponding to the recombination in the ground state and the first-and second-excited states [30]. The QD carrier density saturation value n sat D is then given by…”
Section: Numerical Simulation Using Rate Equation Modelmentioning
confidence: 99%