2011
DOI: 10.1109/tps.2011.2165856
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Arrays of Microplasma Jets Generated by Double Parabolic Microcavities in an Hourglass Configuration

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Cited by 8 publications
(3 citation statements)
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“…Atmospheric pressure plasmas have been actively explored in fields ranging from microstructure to large-scale applications because of their wide potential as reactive plasmas [1][2][3][4][5][6]. In the past, most studies have focused on the development and optimization of the plasma to enhance the production yield of chemical species for specific utilizations or on empirically discovering new phenomena through parametric studies and direct characterization of the plasma [7][8][9][10].…”
Section: Introductionmentioning
confidence: 99%
“…Atmospheric pressure plasmas have been actively explored in fields ranging from microstructure to large-scale applications because of their wide potential as reactive plasmas [1][2][3][4][5][6]. In the past, most studies have focused on the development and optimization of the plasma to enhance the production yield of chemical species for specific utilizations or on empirically discovering new phenomena through parametric studies and direct characterization of the plasma [7][8][9][10].…”
Section: Introductionmentioning
confidence: 99%
“…Various bio‐compatible APNTP sources have been developed in laboratories all around the world. Commonly reported are single jets, bundles of single jets, which are either individually ballasted, or share common electrodes with the same ballast . Also, there are reports of plasma brushes with the usual circular opening of the gas channel being replaced by a thin slot .…”
Section: Introductionmentioning
confidence: 99%
“…Many progresses have been observed in the application of microplasma direct etching of material due to the merits of maskless, high efficiency and low cost. Different configurations have been studied for microplasma material etching so far, such as microplasma jets [9][10][11] and microcavity discharge plasmas [12][13][14], et al. However, these devices can only achieve etching resolution of tens to a few hundred micrometers, which can not satisfy the requirements In this paper, we propose a novel maskless sub-micro or nanoscale plasma etching method based on microplasma reactor array.…”
Section: Introductionmentioning
confidence: 99%